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	Post-processing of fused silica and its effects on damage resistance to nanosecond pulsed UV lasers (EI收录SCI收录)
	Ye, Hui[1,2]; Li, Yaguo[1]; Zhang, Qinghua[1]; Wang, Wei[3]; Yuan, Zhigang[1]; Wang, Jian[1]; Xu, Qiao[3]
刊名	Applied Optics
	2016
卷号	55页码:3017-3025
关键词	Cleaning Etching Fused silica Hydrofluoric acid Light transmission Pulsed lasers Silica Surface roughness Taguchi methods Ultrafast lasers Ultraviolet lasers
URL标识	查看原文
内容类型	期刊论文
URI标识	http://www.corc.org.cn/handle/1471x/2198113
专题	华南理工大学
作者单位	1.[1] Fine Optical Engineering Research Center, Chengdu, China 2.[2] School of Mechanical and Electrical Engineering, Xiamen University, Xiamen, China 3.[3] Research Center of Laser Fusion, China Academy of Engineering Physics, Mianyang, China
推荐引用方式 GB/T 7714	Ye, Hui[1,2],Li, Yaguo[1],Zhang, Qinghua[1],等. Post-processing of fused silica and its effects on damage resistance to nanosecond pulsed UV lasers (EI收录SCI收录)[J]. Applied Optics,2016,55:3017-3025.
APA	Ye, Hui[1,2].,Li, Yaguo[1].,Zhang, Qinghua[1].,Wang, Wei[3].,Yuan, Zhigang[1].,...&Xu, Qiao[3].(2016).Post-processing of fused silica and its effects on damage resistance to nanosecond pulsed UV lasers (EI收录SCI收录).Applied Optics,55,3017-3025.
MLA	Ye, Hui[1,2],et al."Post-processing of fused silica and its effects on damage resistance to nanosecond pulsed UV lasers (EI收录SCI收录)".Applied Optics 55(2016):3017-3025.

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