QQ客服 官方微博 反馈留言

	Preparation of Ag2O modified silica abrasives and their chemical mechanical polishing performances on sapphire
	Zhang, Baichun[1]; Lei, Hong[2]; Chen, Yi[3]
刊名	FRICTION
	2017
卷号	5页码:429-436
关键词	chemical mechanical polishing Ag-doped colloidal silica abrasive sapphire material removal rate
ISSN号	2223-7690
URL标识	查看原文
内容类型	期刊论文
URI标识	http://www.corc.org.cn/handle/1471x/2182791
专题	上海大学
作者单位	1.[1]Shanghai Univ, Res Ctr Nanosci & Nanotechnol, Shanghai 200444, Peoples R China. 2.[2]Shanghai Univ, Res Ctr Nanosci & Nanotechnol, Shanghai 200444, Peoples R China. 3.[3]Shanghai Univ, Res Ctr Nanosci & Nanotechnol, Shanghai 200444, Peoples R China.
推荐引用方式 GB/T 7714	Zhang, Baichun[1],Lei, Hong[2],Chen, Yi[3]. Preparation of Ag2O modified silica abrasives and their chemical mechanical polishing performances on sapphire[J]. FRICTION,2017,5:429-436.
APA	Zhang, Baichun[1],Lei, Hong[2],&Chen, Yi[3].(2017).Preparation of Ag2O modified silica abrasives and their chemical mechanical polishing performances on sapphire.FRICTION,5,429-436.
MLA	Zhang, Baichun[1],et al."Preparation of Ag2O modified silica abrasives and their chemical mechanical polishing performances on sapphire".FRICTION 5(2017):429-436.

个性服务

查看访问统计

相关权益政策

暂无数据

收藏/分享

除非特别说明，本系统中所有内容都受版权保护，并保留所有权利。