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	Remote plasma-enhanced atomic layer deposition of metallic TiN films with low work function and high uniformity
	Zhu, Yafeng[1]; Li, Fangsen[2]; Rong Huang[3]; Tong Liu[4]; Zhao, Yanfei[5]; Yang Shen[6]; Jian Zhang[7]; An Dingsun[8]; Yun Guo[9]
刊名	JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A
	2018
卷号	36
ISSN号	0734-2101
URL标识	查看原文
内容类型	期刊论文
URI标识	http://www.corc.org.cn/handle/1471x/2171619
专题	上海大学
作者单位	1.[1]Shanghai Univ, Sch Mat Sci & Engn, Shanghai 200444, Peoples R China. 2.Chinese Acad Sci, Suzhou Inst Nanotech & Nanobion SINANO, Vacuum Interconnected Nanotech Workstn NanoX, Suzhou 215123, Peoples R China. 3.[2]Chinese Acad Sci, Suzhou Inst Nanotech & Nanobion SINANO, Vacuum Interconnected Nanotech Workstn NanoX, Suzhou 215123, Peoples R China. 4.[3]Chinese Acad Sci, Suzhou Inst Nanotech & Nanobion SINANO, Vacuum Interconnected Nanotech Workstn NanoX, Suzhou 215123, Peoples R China. 5.[4]Chinese Acad Sci, Suzhou Inst Nanotech & Nanobion SINANO, Vacuum Interconnected Nanotech Workstn NanoX, Suzhou 215123, Peoples R China. 6.[5]Chinese Acad Sci, Suzhou Inst Nanotech & Nanobion SINANO, Vacuum Interconnected Nanotech Workstn NanoX, Suzhou 215123, Peoples R China. 7.[6]Chinese Acad Sci, Suzhou Inst Nanotech & Nanobion SINANO, Vacuum Interconnected Nanotech Workstn NanoX, Suzhou 215123, Peoples R China. 8.[7]Chinese Acad Sci, Suzhou Inst Nanotech & Nanobion SINANO, Vacuum Interconnected Nanotech Workstn NanoX, Suzhou 215123, Peoples R China. 9.[8]Chinese Acad Sci, Suzhou Inst Nanotech & Nanobion SINANO, Vacuum Interconnected Nanotech Workstn NanoX, Suzhou 215123, Peoples R China. 10.[9]Shanghai Univ, Sch Mat Sci & Engn, Shanghai 200444, Peoples R China.
推荐引用方式 GB/T 7714	Zhu, Yafeng[1],Li, Fangsen[2],Rong Huang[3],et al. Remote plasma-enhanced atomic layer deposition of metallic TiN films with low work function and high uniformity[J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A,2018,36.
APA	Zhu, Yafeng[1].,Li, Fangsen[2].,Rong Huang[3].,Tong Liu[4].,Zhao, Yanfei[5].,...&Yun Guo[9].(2018).Remote plasma-enhanced atomic layer deposition of metallic TiN films with low work function and high uniformity.JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A,36.
MLA	Zhu, Yafeng[1],et al."Remote plasma-enhanced atomic layer deposition of metallic TiN films with low work function and high uniformity".JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A 36(2018).

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