High-reflectivity AlN/GaN distributed Bragg reflectors grown on sapphire substrates by MOCVD | |
Wu CM ; Zhang BP ; Shang JZ ; Cai LE ; Zhang JY ; Yu JZ ; Wang QM | |
刊名 | semiconductor science and technology |
2011 | |
卷号 | 26期号:5页码:article no.55013 |
关键词 | CHEMICAL-VAPOR-DEPOSITION MOLECULAR-BEAM EPITAXY PHASE EPITAXY MIRRORS GAN WAVELENGTHS |
ISSN号 | 0268-1242 |
通讯作者 | wu, cm, xiamen univ, dept phys, lab micro nano optoelect, xiamen 361005, peoples r china. |
学科主题 | 光电子学 |
收录类别 | SCI |
资助信息 | project of high technology research and development of china [2006aa03z409]; national natural science foundation of china [10974165, 91023048] |
语种 | 英语 |
公开日期 | 2011-07-05 ; 2011-07-15 |
附注 | high-reflectivity aln/gan distributed bragg reflectors (dbrs) were grown on c-plane sapphire substrates by metalorganic chemical vapor deposition (mocvd). a low temperature (lt) predeposition aln layer and indium doping during the growth of the lambda/4 aln layers were adopted to improve the quality of the dbr. during the growth of the dbr, the structural alternation occurred abruptly when an aln layer was grown on a gan layer but gradually in reverse order, which resulted in a stack of quasi-three-layer periodic arrangement rather than two-layer arrangement for one growth period. the peak reflectivity of dbrs reaches 99% at the designed wavelength. the root mean square (rms) roughness of the surface is around 4 nm over a 10 mu m x 10 mu m surface area of the dbr. meanwhile, the high-reflectivity (93%) and crack-free dbr with only 16-period aln/gan structures was obtained by employing an optimized aln predeposition layer. |
内容类型 | 期刊论文 |
源URL | [http://ir.semi.ac.cn/handle/172111/20981] |
专题 | 半导体研究所_集成光电子学国家重点实验室 |
推荐引用方式 GB/T 7714 | Wu CM,Zhang BP,Shang JZ,et al. High-reflectivity AlN/GaN distributed Bragg reflectors grown on sapphire substrates by MOCVD[J]. semiconductor science and technology,2011,26(5):article no.55013. |
APA | Wu CM.,Zhang BP.,Shang JZ.,Cai LE.,Zhang JY.,...&Wang QM.(2011).High-reflectivity AlN/GaN distributed Bragg reflectors grown on sapphire substrates by MOCVD.semiconductor science and technology,26(5),article no.55013. |
MLA | Wu CM,et al."High-reflectivity AlN/GaN distributed Bragg reflectors grown on sapphire substrates by MOCVD".semiconductor science and technology 26.5(2011):article no.55013. |
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