| Technological Merits, Process Complexity, and Cost Analysis of Self-aligned Multiple Patterning (CPCI-S收录) | |
| Chen, Yijian[1]; Cheng, Qi[1]; Kang, Weiling[1] | |
| 会议名称 | OPTICAL MICROLITHOGRAPHY XXV, PTS 1AND 2 |
| 关键词 | Self-aligned multiple patterning (SAMP) self-aligned double (SADP) triple (SATP) quadruple (SAQP) sextuple (SASP) octuple (SAOP) patterning mandrel spacer |
| URL标识 | 查看原文 |
| 内容类型 | 会议论文 |
| URI标识 | http://www.corc.org.cn/handle/1471x/2057096 |
| 专题 | 华南理工大学 |
| 作者单位 | Peking Univ, Shenzhen Grad Sch, Sch Comp & Informat Engn, Shenzhen 518055, Guangdong, Peoples R China |
| 推荐引用方式 GB/T 7714 | Chen, Yijian[1],Cheng, Qi[1],Kang, Weiling[1]. Technological Merits, Process Complexity, and Cost Analysis of Self-aligned Multiple Patterning (CPCI-S收录)[C]. 见:OPTICAL MICROLITHOGRAPHY XXV, PTS 1AND 2. |
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