SiON as a barrier layer for depositing an Al2O3 thin film on Si for gate applications

	SiON as a barrier layer for depositing an Al2O3 thin film on Si for gate applications
	Congmian Zhen ; Gang He ; Xiaoliang Wang ; Yukihiro Shimogaki
刊名	surface and interface analysis
	2009
期号	41
合作状况	其它
学科主题	纳米材料与技术
收录类别	SCI
公开日期	2010-03-08
内容类型	期刊论文
源URL	[http://ir.hfcas.ac.cn/handle/334002/3059]
专题	合肥物质科学研究院_中科院固体物理研究所
推荐引用方式 GB/T 7714	Congmian Zhen,Gang He,Xiaoliang Wang,et al. SiON as a barrier layer for depositing an Al2O3 thin film on Si for gate applications[J]. surface and interface analysis,2009(41).
APA	Congmian Zhen,Gang He,Xiaoliang Wang,&Yukihiro Shimogaki.(2009).SiON as a barrier layer for depositing an Al2O3 thin film on Si for gate applications.surface and interface analysis(41).
MLA	Congmian Zhen,et al."SiON as a barrier layer for depositing an Al2O3 thin film on Si for gate applications".surface and interface analysis .41(2009).