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	UV-induced carbonyl generation with formic acid for sensitive determination of nickel by atomic fluorescence spectrometry
	Liwei Liu; Hao Deng; Li Wu; Chengbin Zheng; Xiandeng Hou
刊名	Talanta
	2010
卷号	Vol.80 No.3页码:1239-1244
关键词	Carbonyl generation Sample introduction Atomic fluorescence spectrometry
ISSN号	0039-9140
URL标识	查看原文
内容类型	期刊论文
URI标识	http://www.corc.org.cn/handle/1471x/1834500
专题	四川大学
作者单位	1.Sichuan Univ, Analyt & Testing Ctr, Chengdu 610064, Sichuan, Peoples R China   增强组织信息的名称     Sichuan University 2.Sichuan Univ, Coll Chem, Chengdu 610064, Sichuan, Peoples R China   增强组织信息的名称     Sichuan University
推荐引用方式 GB/T 7714	Liwei Liu,Hao Deng,Li Wu,et al. UV-induced carbonyl generation with formic acid for sensitive determination of nickel by atomic fluorescence spectrometry[J]. Talanta,2010,Vol.80 No.3:1239-1244.
APA	Liwei Liu,Hao Deng,Li Wu,Chengbin Zheng,&Xiandeng Hou.(2010).UV-induced carbonyl generation with formic acid for sensitive determination of nickel by atomic fluorescence spectrometry.Talanta,Vol.80 No.3,1239-1244.
MLA	Liwei Liu,et al."UV-induced carbonyl generation with formic acid for sensitive determination of nickel by atomic fluorescence spectrometry".Talanta Vol.80 No.3(2010):1239-1244.

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