One-step lithography for fabrication of multifunction diffractive structures with grey-tone mask | |
Fuhua Gao; Jun Yao; Yangsu Zeng; Shiwei Xie; Yongkang Guo and Zheng Cui | |
刊名 | Microelectronic Engineering
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2002 | |
卷号 | Vol.61-62页码:165-171 |
关键词 | Grey-tone photolithography Grey scale mask Beam sampling grating Colour separation grating |
URL标识 | 查看原文 |
内容类型 | 期刊论文 |
URI标识 | http://www.corc.org.cn/handle/1471x/1833708 |
专题 | 四川大学 |
作者单位 | 1.Sichuan Univ, Dept Phys, Chengdu 610064, Peoples R China 2.Rutherford Appleton Lab, Didcot O 3.0QX, Oxon, England |
推荐引用方式 GB/T 7714 | Fuhua Gao,Jun Yao,Yangsu Zeng,et al. One-step lithography for fabrication of multifunction diffractive structures with grey-tone mask[J]. Microelectronic Engineering,2002,Vol.61-62:165-171. |
APA | Fuhua Gao,Jun Yao,Yangsu Zeng,Shiwei Xie,&Yongkang Guo and Zheng Cui.(2002).One-step lithography for fabrication of multifunction diffractive structures with grey-tone mask.Microelectronic Engineering,Vol.61-62,165-171. |
MLA | Fuhua Gao,et al."One-step lithography for fabrication of multifunction diffractive structures with grey-tone mask".Microelectronic Engineering Vol.61-62(2002):165-171. |
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