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	One-step lithography for fabrication of multifunction diffractive structures with grey-tone mask
	Fuhua Gao; Jun Yao; Yangsu Zeng; Shiwei Xie; Yongkang Guo and Zheng Cui
刊名	Microelectronic Engineering
	2002
卷号	Vol.61-62页码:165-171
关键词	Grey-tone photolithography Grey scale mask Beam sampling grating Colour separation grating
URL标识	查看原文
内容类型	期刊论文
URI标识	http://www.corc.org.cn/handle/1471x/1833708
专题	四川大学
作者单位	1.Sichuan Univ, Dept Phys, Chengdu 610064, Peoples R China 2.Rutherford Appleton Lab, Didcot O 3.0QX, Oxon, England
推荐引用方式 GB/T 7714	Fuhua Gao,Jun Yao,Yangsu Zeng,et al. One-step lithography for fabrication of multifunction diffractive structures with grey-tone mask[J]. Microelectronic Engineering,2002,Vol.61-62:165-171.
APA	Fuhua Gao,Jun Yao,Yangsu Zeng,Shiwei Xie,&Yongkang Guo and Zheng Cui.(2002).One-step lithography for fabrication of multifunction diffractive structures with grey-tone mask.Microelectronic Engineering,Vol.61-62,165-171.
MLA	Fuhua Gao,et al."One-step lithography for fabrication of multifunction diffractive structures with grey-tone mask".Microelectronic Engineering Vol.61-62(2002):165-171.

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