Colossal permittivity with ultralow dielectric loss in In + Ta co-doped rutile TiO2 | |
Dong, Wen1; Hu, Wanbiao1; Frankcombe, Terry J.1,2; Chen, Dehong1; Zhou, Chao3; Fu, Zhenxiao3; Cândido, Ladir4; Hai, Guoqiang5; Chen, Hua6; Li, Yongxiang7 | |
刊名 | Journal of Materials Chemistry A |
2017 | |
卷号 | 5期号:11页码:5436-5441 |
ISSN号 | 20507488 |
DOI | 10.1039/c6ta08337d |
英文摘要 | Colossal permittivity (CP) materials have many important applications in electronics but their development has generally been hindered due to the difficulty in achieving a relatively low dielectric loss. In this work, we report an In + Ta co-doped TiO2material system that manifests high dielectric permittivity and low dielectric loss based on the electron-pinned defect-dipole design. The dielectric loss can be reduced down to e.g. 0.002 at 1 kHz, giving high performance, low temperature dependent dielectric properties i.e. Εr> 104with tan δ © The Royal Society of Chemistry. |
内容类型 | 期刊论文 |
源URL | [http://ir.sic.ac.cn/handle/331005/25491] |
专题 | 中国科学院上海硅酸盐研究所 |
作者单位 | 1.Research School of Chemistry, Australian National University, ACT; 2601, Australia; 2.School of Physical, Environmental and Mathematical Sciences, University of New South Wales, Canberra; ACT; 2601, Australia; 3.Fenghua Advanced Technology Holding Co. Ltd., China; 4.Instituto de Física, Universidade Federal de Goiás, Goiânia; GO; 74001-970, Brazil; 5.Instituto de Física de São Carlos, Universidade de São Paulo, São Carlos; SP; 13560-970, Brazil; 6.Centre for Advanced Microscopy, Australian National University, ACT; 2601, Australia; 7.Key Lab. of Inorganic Functional Materials and Devices, Shanghai Institute of Ceramics, Chinese Academy of Sciences, Shanghai; 200050, China |
推荐引用方式 GB/T 7714 | Dong, Wen,Hu, Wanbiao,Frankcombe, Terry J.,et al. Colossal permittivity with ultralow dielectric loss in In + Ta co-doped rutile TiO2[J]. Journal of Materials Chemistry A,2017,5(11):5436-5441. |
APA | Dong, Wen.,Hu, Wanbiao.,Frankcombe, Terry J..,Chen, Dehong.,Zhou, Chao.,...&Liu, Yun.(2017).Colossal permittivity with ultralow dielectric loss in In + Ta co-doped rutile TiO2.Journal of Materials Chemistry A,5(11),5436-5441. |
MLA | Dong, Wen,et al."Colossal permittivity with ultralow dielectric loss in In + Ta co-doped rutile TiO2".Journal of Materials Chemistry A 5.11(2017):5436-5441. |
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