| Measurement of doping concentration in boron-doped diamond film from capacitance spectroscopy | |
| Liu K; Johnston C; Chu JH; Roth S; Zhang B; Wan MF | |
| 刊名 | JOURNAL OF APPLIED PHYSICS
 |
| 1997 | |
| 卷号 | 82期号:1页码:286-290 |
| 公开日期 | 2012-11-21 |
| 内容类型 | 期刊论文 |
| 源URL | [http://202.127.1.142/handle/181331/6390]  |
| 专题 | 上海技术物理研究所_上海技物所 |
| 推荐引用方式 GB/T 7714 | Liu K,Johnston C,Chu JH,et al. Measurement of doping concentration in boron-doped diamond film from capacitance spectroscopy[J]. JOURNAL OF APPLIED PHYSICS,1997,82(1):286-290. |
| APA | Liu K,Johnston C,Chu JH,Roth S,Zhang B,&Wan MF.(1997).Measurement of doping concentration in boron-doped diamond film from capacitance spectroscopy.JOURNAL OF APPLIED PHYSICS,82(1),286-290. |
| MLA | Liu K,et al."Measurement of doping concentration in boron-doped diamond film from capacitance spectroscopy".JOURNAL OF APPLIED PHYSICS 82.1(1997):286-290. |
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