Evolution of microstructure and related properties of PbZr0.4Ti0.6O3 films on F-doped tin oxide with annealing temperature

	Evolution of microstructure and related properties of PbZr0.4Ti0.6O3 films on F-doped tin oxide with annealing temperature
	T. Zhang, G. J. Hu, H. J. Bu, J. Wu, J. H. Chu, N. Dai
刊名	JOURNAL OF APPLIED PHYSICS
	2010
卷号	107
WOS记录号	WOS:000277303200078
公开日期	2011-09-13
内容类型	期刊论文
源URL	[http://202.127.1.142/handle/181331/2080]
专题	上海技术物理研究所_上海技物所
推荐引用方式 GB/T 7714	T. Zhang, G. J. Hu, H. J. Bu, J. Wu, J. H. Chu, N. Dai. Evolution of microstructure and related properties of PbZr0.4Ti0.6O3 films on F-doped tin oxide with annealing temperature[J]. JOURNAL OF APPLIED PHYSICS,2010,107.
APA	T. Zhang, G. J. Hu, H. J. Bu, J. Wu, J. H. Chu, N. Dai.(2010).Evolution of microstructure and related properties of PbZr0.4Ti0.6O3 films on F-doped tin oxide with annealing temperature.JOURNAL OF APPLIED PHYSICS,107.
MLA	T. Zhang, G. J. Hu, H. J. Bu, J. Wu, J. H. Chu, N. Dai."Evolution of microstructure and related properties of PbZr0.4Ti0.6O3 films on F-doped tin oxide with annealing temperature".JOURNAL OF APPLIED PHYSICS 107(2010).