Controllable process of nanostructured GaN by maskless inductively coupled plasma (ICP) etching | |
Zhao, Yanfei; Hu Wang; Wei Zhang; Li, Jiadong; Yang Shen; Huang, Zengli(黄增立); Jian Zhang(张鉴); An Dingsun(丁孙安); Zhang J(张鉴); Ding SA(丁孙安) | |
刊名 | JOURNAL OF MICROMECHANICS AND MICROENGINEERING |
2017 | |
语种 | 英语 |
内容类型 | 期刊论文 |
源URL | [http://ir.sinano.ac.cn/handle/332007/5334] |
专题 | 苏州纳米技术与纳米仿生研究所_大科学装置 |
通讯作者 | Zhang J(张鉴); Ding SA(丁孙安) |
推荐引用方式 GB/T 7714 | Zhao, Yanfei,Hu Wang,Wei Zhang,et al. Controllable process of nanostructured GaN by maskless inductively coupled plasma (ICP) etching[J]. JOURNAL OF MICROMECHANICS AND MICROENGINEERING,2017. |
APA | Zhao, Yanfei.,Hu Wang.,Wei Zhang.,Li, Jiadong.,Yang Shen.,...&丁孙安.(2017).Controllable process of nanostructured GaN by maskless inductively coupled plasma (ICP) etching.JOURNAL OF MICROMECHANICS AND MICROENGINEERING. |
MLA | Zhao, Yanfei,et al."Controllable process of nanostructured GaN by maskless inductively coupled plasma (ICP) etching".JOURNAL OF MICROMECHANICS AND MICROENGINEERING (2017). |
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