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题名	镀金脉宽压缩光栅的研制工艺和单脉冲飞秒激光损伤机理研究
作者	王磊磊
文献子类	硕士
导师	晋云霞
关键词	啁啾脉冲放大 Chirped Pulse Amplification 镀金脉宽压缩光栅 Gold Pulse Compression Grating 飞秒损伤 Femtosecond Laser-induced Damage
其他题名	Research on the fabrication and mechanism in single-shot femtosecond laser-induced damage of gold pulse compression grating
英文摘要	镀金脉宽压缩光栅由于明显的带宽优势，在数十飞秒领域的脉宽压缩占据了主导地位。随着拍瓦高功率激光装置的发展，对镀金光栅的抗激光损伤能力提出了更高要求，因而提升镀金光栅的飞秒损伤阈值以及明确镀金光栅的飞秒损伤机理，具有非常重要的科学及实际意义。本文系统研究了高性能镀金脉宽压缩光栅的掩膜制备及镀金工艺，并对不同镀金工艺制备的镀金光栅的光谱性能、力学性能及抗飞秒激光损伤能力进行了表征，重点探讨了不同镀金工艺对光栅单脉冲飞秒损伤行为和损伤机理的影响，提出了理论模型，作出了合理的解释。 具体包括如下三个方面的工作： 1）通过透射式双光路干涉曝光系统成功实现了正弦形光栅掩膜的制备，并研究了条纹对比度、曝光量以及显影条件等对掩膜槽形的影响；通过磁控溅射和电子束蒸发两种镀金工艺实现了金光栅的制备，并通过工艺实验确定了最佳衍射效率光谱所对应的槽形参数和工艺参数，建立了包含镀膜工艺参数、槽形结构、金膜厚度以及衍射效率等的统计数据关系。 2）对两种工艺制备的镀金脉宽压缩光栅在衍射光谱、金膜与基底结合强度以及抗飞秒激光损伤能力等方面进行了表征。结果表明，在衍射光谱满足使用的前提下，磁控溅射工艺制备的金光栅具有更强的金膜与掩膜基底结合强度以及更高的损伤阈值。 3）对两种镀金工艺制备的金光栅的单脉冲飞秒激光损伤行为和机理进行了研究。磁控溅射工艺制备的金光栅表现为典型的熔融性损伤，而电子束蒸发工艺制备的金光栅则表现为典型的应力性损伤。对这两种镀金光栅在损伤阈值和形貌上存在的较大差异，通过双温方程以及热力耦合方程，提出了热、力相结合的损伤机制，给出了合理的解释；指出金膜和光栅掩膜基底的结合强度是决定不同工艺镀金脉宽压缩光栅损伤行为的主要原因，得出镀金脉宽压缩光栅的损伤阈值可以通过增强金膜和光刻胶掩膜基底的结合力来提高的结论。; The gold pulse compression gratings remain the standard for short-pulse (below 100 fs) high-power laser systems because of their broad bandwidth. The development of petawatt scale laser system puts forward higher requirements for laser-induced damage threshold (LIDT) of the gold pulse compression gratings. Therefore, improving the LIDT and deeply understanding the femtosecond damage mechanism of gold pulse compression gratings are critically important for the longevity of high-power short-pulse laser systems. In this study, the fabrication process, including the fabrication of sine-top photoresist profile and the gold deposition technologies to obtain gold pulse compression grating with both high diffraction efficiency and high LIDT are deeply studied. The diffraction spectrum, the mechanical properties and femtosecond laser damage resistance of gold pulse compression grating are also studied in this thesis. And the influence of gold deposition technology on single-shot femtosecond damage mechanism of gold pulse compression grating are mainly deeply discussed. Followings are the three main contents of the thesis: 1) The sine-top photoresist profile is fabricated through the transmission-type double-beam interference exposure system. And the influence of the contrast of fringe patterns, the exposure dose and development condition on the photoresist profile are studied. Magnetron sputtering and e-beam evaporation technology are used in gold deposition process. The best -1st order diffraction spectrum of these two kinds of gold pulse compression grating are obtained through numbers of experiments, and the corresponding groove parameters and technological parameters in gold deposition process are determined. A relation data base including groove parameters, gold deposition technological parameters and diffraction spectrum is established in order to direct the fabrication process of gold pulse compression grating. 2) The diffraction spectrum, the adhesion strength between gold film and photoresist substrate and femtosecond laser damage resistance of these two kinds of gratings are evaluated. The gold pulse compression gratings fabricated by magnetron sputtering technology possess the higher diffraction efficiency, higher LIDT and better adhesion strength between gold film and substrate. 3) The femtosecond laser induced damage behavior and damage mechanism of gold pulse compression gratings and gold films are studied. It is shown that the typical damage morphology of the gold pulse compression grating fabricated by magnetron sputtering technology is the melting of the gold film, which is a kind of thermo-induced damage morphology, whereas that of the gold pulse compression grating fabricated by e-beam evaporation technology is blister or peeling off of the gold film, which is a kind of stress-induced damage morphology. Damage mechanism based on the Two Temperature Model and Thermo-Mechanical Coupling Model are established to analyze the different damage behavior of these two kinds of gold pulse compression gratings. Analysis shows that the adhesion between the gold film and the photoresist substrate plays an important role in determining the damage behavior. Thus, the femtosecond laser resistance of gold pulse compression grating can be improved by enhancing the adhesion between the gold film and the substrate.
学科主题	光学工程
内容类型	学位论文
源URL	[http://ir.siom.ac.cn/handle/181231/30959]
专题	中国科学院上海光学精密机械研究所
作者单位	中国科学院上海光学精密机械研究所
推荐引用方式 GB/T 7714	王磊磊. 镀金脉宽压缩光栅的研制工艺和单脉冲飞秒激光损伤机理研究[D].

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