QQ客服 官方微博 反馈留言

题名	桌面式无掩膜光刻系统的研制
作者	梁鑫
文献子类	硕士
导师	魏劲松
关键词	桌面式光刻系统 Maskless lithography 小孔检焦系统 automatic tracking 自动跟踪系统 flatness measurement 运动平整度检测
其他题名	Desktop maskless lithography system
英文摘要	无掩膜光刻技术是二十世纪八十年代兴起的，具有无需掩膜、成本低、精度可控、加工对象广泛、灵活轻便等优点。随着现代工业的发展，集成电路和芯片的加工和制造是衡量一个国家现代工业发展重要的标志之一。随着智能时代的到来，芯片制造的特征尺寸越来越小，无掩膜光刻技术也向着模块化和小型化的方向发展。国内外机构开展了各种光刻设备的研制，虽然光刻设备的品种多样和种类复杂，工艺技术水平也在不断提高，但还是不能满足设备小型化的要求，所以高精度、低成本和大刻写面积的小型化光刻设备是当前发展的需求之一。 本论文旨在研制一种桌面式、低成本、大面积的桌面式无掩膜光刻系统，通过降低激光的刻写波长、增大刻写物镜的数值孔径（NA）、配合光刻材料的阈值效应与腐蚀等工艺，实现在样品表面的刻写。本装置使用可实现功率调制和脉宽调制的405nm的激光器作为刻写光源，装置中还有红光自动跟踪模块、小孔检焦模块、CCD检焦模块和运动控制单元，以实现对镀膜样品表面的大面积图形的刻写。文中所设计的刻写、跟踪、检焦和CCD模块是论文的主要方面，本论文对整个系统的光路与机械结构的设计和调试进行介绍。本论文主要从以下几个方面： 1. 国内外光刻设备与技术的发展概况。介绍了国内外光刻设备的研究现状，主要掩膜光刻与无掩膜光刻。掩膜光刻主要有投影光刻、纳米压印光刻；无掩膜光刻主要有电子束光刻、空间调制光光刻和激光直写光刻。文中针对主要的各光刻方法进行简单的介绍与对比，得出本桌面式无掩膜光刻系统的设计优势。 2. 本桌面式无掩膜光刻系统的设计和调试。本光刻系统主要由蓝光直写模块、红光自动跟踪模块、小孔检焦模块、CCD模块和电机运动控制单元组成。 3. 在完成以上各模块设计和调试之后，需对整个装置进行联合调试，配合蓝光、红光，需要确定各镜片的位置和角度，还需确定孔后端的光电探测器和四象限探测器（FQD）的位置。在实验中，本系统可以用来绘制恒功率密度的大面积光栅线阵、测量普通开环步进电位移平台的运动平整度与实现对台阶的测量。本系统可刻写线宽为625nm的5mm × 5mm的线阵，腐蚀之后的线宽可达586nm。另外，本系统还可以测量开环电位移台的运动平整度，其测量精度可达100nm。; Since the twentieth century, maskless lithography technology had grown up rapidly with the advantages of without mask, low cost, controllable precision, processing a wide range of products, flexible. With the development of modern industry, the manufacturing and processing of integrated circuits and chips are increasingly becoming a measurement level of a country’s modern industry. With the arrival of the intelligent era, the size of the chip manufacturing become smaller and smaller, maskless lithography technology is also toward the direction of modularization and miniaturization. Domestic and foreign institutions have carried out a variety of development of lithography equipment. Although the lithography equipment is complex and the technology level is also increasing, it cannot meet the requirements of large sample size and portable equipment. This work aims to develop a desktop maskless lithography system with low-cost and large-scale. One can reduce the numerical aperture (NA) of the focusing lens and the laser wavelength and uses the threshold effect of the lithographic material to write the paterns on the surface of the sample. The system uses a 405nm laser device with power and pulse width modulations. Beside the Blue-laser writing module, the system also has automatic tracking module, the pinhole check focus module, the CCD module and the motion control unit. This work mainly includes the following aspects: 1. The development of lithography equipment and technology is introduced, including mask and maskless lithography. A brief introduction and comparison among lithography methods are made. 2. The desk lithography system is described from the whole frame, the basic principle, the designing of mechanical and optical structures, and the debugging. The experimental setup is mainly composed of the blue-laser direct writing module, the red-laser automatic tracking module, the pinhole detecting focus module, the CCD module and the motor motion control unit. 3. The debugging is made for blue-laser writing unit, red-laser automatic tracking unit and CCD lighting. After the completion of the debugging. The setup is used to write grating array with constant power density. The 5 × 5 mm region is written with the linewidth of 625nm, the linewidth is 586nm after corrosion process. The accuracy of the motion flatness error is measured at 100nm.
学科主题	光学工程
内容类型	学位论文
源URL	[http://ir.siom.ac.cn/handle/181231/31004]
专题	中国科学院上海光学精密机械研究所
作者单位	中国科学院上海光学精密机械研究所
推荐引用方式 GB/T 7714	梁鑫. 桌面式无掩膜光刻系统的研制[D].

个性服务

查看访问统计

相关权益政策

暂无数据

收藏/分享

除非特别说明，本系统中所有内容都受版权保护，并保留所有权利。