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题名	基于点衍射干涉仪的成像系统综合像质检测技术
作者	董冠极
文献子类	硕士
导师	唐锋
关键词	光学检测 Optical Measurement 像差 Aberration 泽尼克多项式 Zernike polynomials 点衍射干涉 Point-diffraction
其他题名	Measurement of the Comprehensive Imaging Quality of Imaging System based on Point Diffraction Interferometer
英文摘要	光学系统成像质量是影响成像系统性能的重要因素，在高精度成像系统装调与使用过程中，需要对其成像质量进行高精度地检测和控制。光学成像系统的成像质量通过球差、畸变、场曲和波像差等像质参数进行描述。传统成像质量检测通过测量初级像质参数或者光学传递函数来评价系统成像质量。许多检测方法需要人工判读，测量效率和测量精度有待提高。现代成像质量检测技术使用波前传感器和干涉仪测量系统波像差来评价系统成像质量。此类技术只能实现系统波像差的高精度测量，并不能直接得出系统畸变与场曲等初级像差。光刻机投影物镜像质原位检测技术是基于光刻曝光、空间像传感、瞳面测量等技术实现光刻投影物镜综合像质的高精度检测与监控，但检测技术依赖于光刻机及其分系统，无法应用于光学系统加工装调车间，以及其他科研和工业应用领域。目前尚无采用同一测量技术与系统能够实现成像系统波像差、倍率、畸变、场曲等综合像质参数高精度检测的方法。针对这一现状，本文围绕基于点衍射干涉仪的光学成像系统综合像质检测技术展开研究，主要工作有： 1.研究了点衍射干涉仪的基本原理、波前相位提取技术和波像差的数值分析算法，设计了基于双光纤点衍射干涉仪检测波像差的技术方案。根据测量原理，进行了原理性实验验证，结果显示基于双光纤点衍射干涉仪的波像差检测技术能够实现成像系统波像差的高精度测量，测量重复性控制在0.1nm RMS以内。所提出的成像系统波像差测量技术具有装置结构简单、测量操作简便的特点，且具备高精度和高可靠性，为后续研究基于点衍射干涉仪的倍率、畸变和场曲检测技术研究奠定了基础。 2.提出了基于双光纤点衍射干涉仪的成像系统倍率高精度测量方法。该方法通过分析双点光源间距、CCD相机空间位置与点衍射干涉场相位泽尼克多项式系数之间的定量关系，得到物面光纤间距和像面光纤像点间距的nm精度测量值，进而完成对倍率的高精度测量。分别进行仿真分析和实验验证，证明了所提出的测量技术的可行性和稳定性，结果表明，倍率测量的扩展测量不确定度为2.64 ppm。所提出的成像系统倍率高精度测量技术具有测量精度高和测量效率高的特点，且具备高可靠性，可以用于显微物镜、光刻投影物镜等高精度成像系统倍率的超高精度测量。 3.研究了基于双光纤点衍射干涉仪的成像系统畸变和场曲高精度测量方法。畸变的检测是通过对两个光纤出射端面连线方向的多个连续视场点倍率的测量来实现的。场曲的检测是利用成像系统Z向最佳成像位置与点衍射干涉仪检测结果离焦项之间的定量关系，确定成像系统中心视场和边缘视场中各个视场点的最佳成像位置，进而得到全视场的场曲分布情况。进行了基于双光纤点衍射干涉仪的畸变和场曲检测方法的原理性实验验证。该方法采用同一装置实现光学系统畸变和场曲的高效、高精度测量，且具有良好的通用性。; The quality of the optical system imaging is an important factor affecting the performance of the imaging system. In the process of adjusting and using the high-precision imaging system, the imaging quality needs to be measured and controlled with high precision. The imaging quality of an optical imaging system is described by image quality parameters such as spherical aberration, distortion, field curvature, wave aberration, etc. Conventional imaging quality inspection evaluates system imaging quality by measuring primary image quality parameters or optical transfer functions. Many detection methods require manual interpretation, thus measurement efficiency and accuracy need to be improved. Modern imaging quality detection technology uses wavefront sensors and interferometers to measure system wavefront aberrations to evaluate system imaging quality. It can only achieve high-precision measurement of system's wavefront aberrations, and can not directly derive the system's primary aberrations such as distortion, field curvature, etc. The in-situ imaging quality inspection technology of the lithography projection lens is based on lithography exposure, aerial image sensing, pupil measurement and other technologies to achieve high-precision detection and monitoring of the comprehensive image quality of the lithography projection lens, but the detection technology relies on the lithography machine and its subsystems,so that it cannot be used in optical system manufacture and alignment workshops, as well as other scientific research and industrial applications. There is no high-precision imaging quality detection technology and system that can realize the measurement of wavefront aberration, magnification, distortion, and field curvature of the imaging system. In view of this situation, this article focuses on the comprehensive image quality detection technology of the optical imaging system based on point diffraction interferometer. The main work done in the thesis is as follows: 1.The basic principle of the point diffraction interferometer, the wavefront phase extraction technique and the numerical analysis algorithm of wavefront aberration are studied. The technical solution of wavefront aberration detection based on the double fiber point diffraction interferometer is presented. According to the principle of measurement, the experimental verification was carried out. The results showed that the wavefront aberration detection technology based on the double fiber point diffraction interferometer can achieve high-precision measurement of the wavefront aberration of the imaging system, and the measurement repeatability is controlled within 0.1 nm RMS. The proposed wavefront aberration measurement technology of the imaging system has the simple device structure and convenient measurement operation, with high accuracy and high reliability. It lays the foundation for the follow-up research on the magnification, distortion and field curvature detection technology based on point diffraction interferometer. 2.A high precision magnification measurement method based on double fiber point-diffraction interferometer is proposed. The separation distance between two fibers and the separation distance between the fibers’ imaging points are measured with nanometer accuracy, by analyzing the quantitative relationship between the system parameters and the Zernike coefficients of the phase distribution of the point-diffraction interference field. The system parameters include the separation distances between the fibers and the separation distances between the fibers’ imaging points, and the spatial parameters of the CCD camera. According to the measured Zernike coefficients, the magnification of the imaging system can be calculated. Numerical simulation and experimental verification have been carried out to demonstrate the feasibility and stability of the proposed measuring method. The results show that the expanded uncertainty of the magnification measurement is 2.64 ppm. The proposed method has the merits of high accuracy, high efficiency and high reliability. It can be used to measure the magnification of high accuracy imaging system with ultra-high precision, such as the magnification of microscope objectives and lithographic projection lens. 3.The imaging system distortion and field curvature high-accuracy measurement method based on the double fiber point diffraction interferometer was studied. Distortion detection is achieved by the measurement of multiple consecutive field-of-view magnifications in the direction of the line connecting the two fibers. The field curvature is obtained from the central and marginal field-of-view optimal imaging positions of the imaging system along z axis determined by using the quantitative relationship between the optimal imaging position and the defocusing term of the interferometer measurement result. The experimental verification of the distortion and field curvature detection method based on the double fiber point diffraction interferometer was carried out. The method has good versatility and can realize high-efficiency and high-precision measurement of optical system distortion and its field curvature using one device.
学科主题	光学工程
内容类型	学位论文
源URL	[http://ir.siom.ac.cn/handle/181231/31105]
专题	中国科学院上海光学精密机械研究所
作者单位	中国科学院上海光学精密机械研究所
推荐引用方式 GB/T 7714	董冠极. 基于点衍射干涉仪的成像系统综合像质检测技术[D].

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