Deep subwavelength interference lithography with tunable pattern period based on bulk plasmon polaritons

CORC > 光电技术研究所 > 中国科学院光电技术研究所 > 微细加工光学技术国家重点实验室（开放室）

	Deep subwavelength interference lithography with tunable pattern period based on bulk plasmon polaritons
	Liu, Hongchao 1; Kong, Weijie ; Liu, Kaipeng ; Zhao, Chengwei ; Du, Wenjuan 1; Wang, Changtao ; Liu, Ling 1; Gao, Ping ; Pu, Mingbo ; Luo, Xiangang
刊名	Optics Express
	2017
卷号	25 期号:17 页码:20511-20521
关键词	HIGH-ASPECT-RATIO PHOTONIC CRYSTALS EUV LITHOGRAPHY FABRICATION DIFFRACTION NANOLITHOGRAPHY EXTREME
ISSN号	1094-4087
英文摘要	Interference lithography based on surface plasmon polaritons has been proven to break the diffraction limit and deliver the high imaging resolution. However, most previously reported studies suffer from the inflexible pattern pitch for a certain structure ascribed to fixed excitation mode, which limits the applications in micro-/nano- fabrications. In this work, the large area deep subwavelength interference lithography with tunable pattern period based on bulk plasmon polaritons (BPPs) is proposed. By simply tuning the incident angle, the spatial frequencies of the selected BPPs modes squeezed through hyperbolic metamaterial changes correspondingly. As a result, the pitch of the interference pattern is continuously altered. The results demonstrate that one-dimensional and two-dimensional periodic patterns with pitch resolution ranging from 45 nm (similar to lambda/10) to 115 nm (similar to lambda/4) can be generated under 436 nm illumination. Additionally, the general method of designing such an interference lithography system is also discussed, which can be used for nanoscale fabrication in this fashion. (C) 2017 Optical Society of America
语种	英语
内容类型	期刊论文
源URL	[http://ir.ioe.ac.cn/handle/181551/8871]
专题	光电技术研究所_微细加工光学技术国家重点实验室（开放室）
作者单位	1.Chinese Acad Sci, Inst Opt & Elect, State Key Lab Opt Technol Nanofabricat & Microeng, POB 350, Chengdu 610209, Sichuan, Peoples R China 2.Univ Chinese Acad Sci, Beijing 100049, Peoples R China
推荐引用方式 GB/T 7714	Liu, Hongchao,Kong, Weijie,Liu, Kaipeng,et al. Deep subwavelength interference lithography with tunable pattern period based on bulk plasmon polaritons[J]. Optics Express,2017,25(17):20511-20521.
APA	Liu, Hongchao.,Kong, Weijie.,Liu, Kaipeng.,Zhao, Chengwei.,Du, Wenjuan.,...&Luo, Xiangang.(2017).Deep subwavelength interference lithography with tunable pattern period based on bulk plasmon polaritons.Optics Express,25(17),20511-20521.
MLA	Liu, Hongchao,et al."Deep subwavelength interference lithography with tunable pattern period based on bulk plasmon polaritons".Optics Express 25.17(2017):20511-20521.