Fabrication of hybrid soft-nanoimprint stamp with sub-100 nm resolution based on thiol-ene

doi:10.1166/jnn.2016.12970

CORC > 光电技术研究所 > 中国科学院光电技术研究所 > 微电子装备总体研究室（四室）

	Fabrication of hybrid soft-nanoimprint stamp with sub-100 nm resolution based on thiol-ene
	Zhang, Man 1; Deng, Qiling 1; Shi, Lifang 1; Pang, Hui 1; Cao, Axiu 1; Hu, Song 1
刊名	Journal of Nanoscience and Nanotechnology
	2016
卷号	16 期号:12 页码:12316-12320
关键词	Curing Fabrication Microchannels Molds Nanoimprint Lithography Nanostructures Pulse Width Modulation Substrates Synthesis (Chemical)
ISSN号	1533-4880
DOI	10.1166/jnn.2016.12970
文献子类	J
英文摘要	We proposed a method for fabrication of hybrid soft-nanoimprint stamp with sub-100 nm resolution based on UV-curable thiol-ene polymer and via soft lithography which consisted of rigid structure layer and flexible substrate. An elastic film was firstly prepared as the flexible substrate and the thiol-ene prepolymer was then spin-coated onto the master mold with nanostructures. The flexible film was imprinted against the resistant layer to make a conformal contact. The thiol-ene formed a cross-linked polymer network after UV light treatment via "click chemistry" at ambient conditions and without inhabitation from oxygen or moisture. The hybrid stamp was achieved after releasing the mold. The rigid thiol-ene nanostructure had high-resolution due to excellent properties. The hybrid stamps, composed of rigid cross-linked thiol-ene features with sub-100 nm resolution on an elastic poly(dimethylsiloxane) (PDMS) substrate, were fabricated based on the new method. Copyright © 2016 American Scientific Publishers All rights reserved.
语种	英语
WOS记录号	WOS:000387279100031
资助机构	National Nature Science Foundation of China [11174281, 61275061, 11074251]
内容类型	期刊论文
源URL	[http://ir.ioe.ac.cn/handle/181551/8499]
专题	光电技术研究所_微电子装备总体研究室（四室）
作者单位	1.Institute of Optics and Electronics, Chinese Academy of Sciences, Chengdu 2.610209, China
推荐引用方式 GB/T 7714	Zhang, Man,Deng, Qiling,Shi, Lifang,et al. Fabrication of hybrid soft-nanoimprint stamp with sub-100 nm resolution based on thiol-ene[J]. Journal of Nanoscience and Nanotechnology,2016,16(12):12316-12320.
APA	Zhang, Man,Deng, Qiling,Shi, Lifang,Pang, Hui,Cao, Axiu,&Hu, Song.(2016).Fabrication of hybrid soft-nanoimprint stamp with sub-100 nm resolution based on thiol-ene.Journal of Nanoscience and Nanotechnology,16(12),12316-12320.
MLA	Zhang, Man,et al."Fabrication of hybrid soft-nanoimprint stamp with sub-100 nm resolution based on thiol-ene".Journal of Nanoscience and Nanotechnology 16.12(2016):12316-12320.