Edge smoothness enhancement in DMD scanning lithography system based on a wobulation technique
Chen, R. H.; H. Liu; H. L. Zhang; W. J. Zhang; J. Xu; W. B. Xu and J. H. Li
刊名Optics Express
2017
卷号25期号:18
英文摘要The resolution of digital micro-mirror device (DMD) scanning lithography is limited in the transverse direction (the scanning direction is vertical) as a result of the compacted size of the DMD micro-mirror and the low magnification of the projection lens. Above-stated restrictions lead to an unsatisfactory saw-tooth edge (size similar to one DMD pixel) after the lithography process within all directions except for the scanning orientation. In order to smooth the edge, an optimized sub-pattern construction method, described as the combination of wobulation techniques and the continuous scanning lithography process, is proposed. Afterward, lithography experiments were implemented by introducing the wobulation techniques within the DMD scanning lithography system. The experimental results show that the saw-tooth edge is reduced to nearly 0.5 pixel size after 1/2 pixel dislocation superposition exposure, and is even scaled down to less than 0.1 pixel after 1/4 pixel dislocation superposition exposure. At this point, the edge of the lithography pattern is appropriately smoothed. The effectiveness of the above-mentioned method that improves the edge smoothness of the lithography pattern is demonstrated. (C) 2017 Optical Society of America
语种英语
内容类型期刊论文
源URL[http://ir.ciomp.ac.cn/handle/181722/58856]  
专题长春光学精密机械与物理研究所_中科院长春光机所知识产出
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GB/T 7714
Chen, R. H.,H. Liu,H. L. Zhang,et al. Edge smoothness enhancement in DMD scanning lithography system based on a wobulation technique[J]. Optics Express,2017,25(18).
APA Chen, R. H.,H. Liu,H. L. Zhang,W. J. Zhang,J. Xu,&W. B. Xu and J. H. Li.(2017).Edge smoothness enhancement in DMD scanning lithography system based on a wobulation technique.Optics Express,25(18).
MLA Chen, R. H.,et al."Edge smoothness enhancement in DMD scanning lithography system based on a wobulation technique".Optics Express 25.18(2017).
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