Doping Ti to achieve microstructural refinement and strength enhancement in a high volume fraction Y2O3 dispersion strengthened Cu

doi:10.1016/j.jallcom.2018.04.224

CORC > 上海应用物理研究所 > 中国科学院上海应用物理研究所 > 中科院上海应用物理研究所2011-2017年

	Doping Ti to achieve microstructural refinement and strength enhancement in a high volume fraction Y2O3 dispersion strengthened Cu
	Zhou, DS ; Wang, XK ; Zeng, W ; Yang, C ; Pan, HC ; Li, CG ; Liu, YJ ; Zhang, DL
刊名	JOURNAL OF ALLOYS AND COMPOUNDS
	2018
卷号	753 页码:18-27
关键词	Mechanical-properties Orientation Relationships Electrical-resistivity Internal Oxidation Tensile Ductility Grained Copper Alloys Particles Composite Temperature
ISSN号	0925-8388
DOI	10.1016/j.jallcom.2018.04.224
文献子类	期刊论文
英文摘要	In this work, high volume fraction Y2O3 dispersion strengthened Ti-free and Ti-doped Cu samples were prepared by mechanical alloying, high temperature heat treatment and powder compact extrusion to study the role of alloying Ti element on microstructures, mechanical properties and electrical conductivity of the extruded samples. It is found that the addition of a small amount of 0.4 wt.%Ti effectively suppresses the coarsening of Y2O3 particles during material fabrication, which produces smaller and more uniform oxide particles distributed in a homogeneous ultrafine grained Cu matrix. However, a heterogeneous Cu matrix microstructure, consisting of elongated micrometer-scale Cu grains and equiaxed ultrafine Cu grains, is observed in the Ti-free sample due to significant coarsening of the Y2O3 particles. The different microstructural features of the two extruded samples lead to distinctively different mechanical behaviors and electrical conductivities. The energy dispersive X-ray spectrometry elemental and high resolution transmission electron microscopy analysis suggest that the stabilizing mechanisms of the Y2O3 particles involve both the segregation of Ti atoms to the surface layers of large Y2O3 particles and dissolution of Ti atoms into small Y2O3 particles to form complex particles. (C) 2018 Elsevier B.V. All rights reserved.
语种	英语
WOS记录号	WOS:000432674100004
内容类型	期刊论文
源URL	[http://ir.sinap.ac.cn/handle/331007/28976]
专题	上海应用物理研究所_中科院上海应用物理研究所2011-2017年
作者单位	1.Zhou, DS 2.Wang, XK 3.Zeng, W 4.Yang, C 5.Pan, HC 6.Li, CG 7.Liu, YJ 8.Zhang, DL
推荐引用方式 GB/T 7714	Zhou, DS,Wang, XK,Zeng, W,et al. Doping Ti to achieve microstructural refinement and strength enhancement in a high volume fraction Y2O3 dispersion strengthened Cu[J]. JOURNAL OF ALLOYS AND COMPOUNDS,2018,753:18-27.
APA	Zhou, DS.,Wang, XK.,Zeng, W.,Yang, C.,Pan, HC.,...&Zhang, DL.(2018).Doping Ti to achieve microstructural refinement and strength enhancement in a high volume fraction Y2O3 dispersion strengthened Cu.JOURNAL OF ALLOYS AND COMPOUNDS,753,18-27.
MLA	Zhou, DS,et al."Doping Ti to achieve microstructural refinement and strength enhancement in a high volume fraction Y2O3 dispersion strengthened Cu".JOURNAL OF ALLOYS AND COMPOUNDS 753(2018):18-27.