Influence of symmetry and duty cycles on the pattern generation in achromatic Talbot lithography

doi:10.1116/1.4974930

CORC > 上海应用物理研究所 > 中国科学院上海应用物理研究所 > 中科院上海应用物理研究所2011-2017年

	Influence of symmetry and duty cycles on the pattern generation in achromatic Talbot lithography
	Yang, SM; Zhao, J; Wang, LS; Zhu, FY; Xue, CF; Liu, HG; Sang, HZ; Wu, YQ; Tai, RZ
刊名	JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B
	2017
卷号	35 期号:2 页码:-
ISSN号	1071-1023
DOI	10.1116/1.4974930
文献子类	期刊论文
英文摘要	Achromatic Talbot lithography has been proved as a robust and high throughput technique for large area nanopatterning with controllable feature sizes and duty cycles. In this work, the influence of symmetry and duty cycles on the pattern generation has been investigated in detail. Compared with square lattice case, no lattice rotation and spatial frequency multiplication can be observed in hexagonal nanopattern generation. Uniform pattern distribution with a 20 nm feature size has been obtained in square and hexagonal lattices by the masks with 144 nm period and similar to 50% duty cycle. For the exposure of mask with a smaller duty cycle, nonuniform dot size distribution has been obtained in the square lattice. While, by using a smaller duty cycle hexagonal lattice mask, a highly uniform periodic hexagonal nanopattern with a 10% duty cycle has been obtained. All the experimental results were consistent with the simulation work. (C) 2017 American Vacuum Society.
语种	英语
WOS记录号	WOS:000397858500043
内容类型	期刊论文
源URL	[http://ir.sinap.ac.cn/handle/331007/27351]
专题	上海应用物理研究所_中科院上海应用物理研究所2011-2017年
推荐引用方式 GB/T 7714	Yang, SM,Zhao, J,Wang, LS,et al. Influence of symmetry and duty cycles on the pattern generation in achromatic Talbot lithography[J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B,2017,35(2):-.
APA	Yang, SM.,Zhao, J.,Wang, LS.,Zhu, FY.,Xue, CF.,...&Tai, RZ.(2017).Influence of symmetry and duty cycles on the pattern generation in achromatic Talbot lithography.JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B,35(2),-.
MLA	Yang, SM,et al."Influence of symmetry and duty cycles on the pattern generation in achromatic Talbot lithography".JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B 35.2(2017):-.