Single-mode-resonance interference in photoresist sub-micron waveguide for high exposure depth nanolithography

doi:10.1016/j.mee.2016.01.004

CORC > 重庆绿色智能技术研究院 > 中国科学院重庆绿色智能技术研究院 > 集成光电技术研究中心

	Single-mode-resonance interference in photoresist sub-micron waveguide for high exposure depth nanolithography
	Yang, Zheng1,2 ; Zhang, Zhiyou 3; Wu, Peng1,2 ; Xia, Liangping 1,2; Yin, Shaoyun1,2 ; Du, Jinglei 3
刊名	MICROELECTRONIC ENGINEERING
	2016-03-25
卷号	154 页码:8-11
关键词	Lithography Subwavelength Nanostructure fabrication Waveguide Single-mode-resonance
ISSN号	0167-9317
DOI	10.1016/j.mee.2016.01.004
通讯作者	Yang, Z (reprint author), Chinese Acad Sci, Chongqing Inst Green & Intelligent Technol, Chongqing, Peoples R China. ; Yang, Z (reprint author), Chongqing Key Lab Multiscale Mfg Technol, Chongqing, Peoples R China.
英文摘要	A high exposure depth nanolithography technology is presented. In the proposed scheme, the photoresist layer is used as a waveguide. With a subwavelength grating (SWG) coupling structure, the incident light is efficiently coupled into the photoresist waveguide, in which the single-mode-resonance (SMR) interference field is formed. Different from other interference lithography, the new scheme can realize high resolution and high exposure depth simultaneously. In this paper, the theoretical model of the SMR interference is established to analyze the light field distribution in the photoresist The simulation result shows that interference pattern with period smaller than 140 nm and depth larger than 900 nm can be obtained in the photoresist, by using 441 nm incident light and 276 nm period grating coupling structure. (c) 2016 Elsevier B.V. All rights reserved.
资助项目	National Natural Science Foundation of China[61275061] ; National Natural Science Foundation of China[61475199]
WOS研究方向	Engineering ; Science & Technology - Other Topics ; Optics ; Physics
语种	英语
出版者	ELSEVIER SCIENCE BV
WOS记录号	WOS:000378363400002
内容类型	期刊论文
源URL	[http://119.78.100.138/handle/2HOD01W0/2587]
专题	集成光电技术研究中心
通讯作者	Yang, Zheng
作者单位	1.Chinese Acad Sci, Chongqing Inst Green & Intelligent Technol, Chongqing, Peoples R China 2.Chongqing Key Lab Multiscale Mfg Technol, Chongqing, Peoples R China 3.Sichuan Univ, Sch Phys Sci & Technol, Inst Nanophoton Technol, Chengdu 610064, Peoples R China
推荐引用方式 GB/T 7714	Yang, Zheng,Zhang, Zhiyou,Wu, Peng,et al. Single-mode-resonance interference in photoresist sub-micron waveguide for high exposure depth nanolithography[J]. MICROELECTRONIC ENGINEERING,2016,154:8-11.
APA	Yang, Zheng,Zhang, Zhiyou,Wu, Peng,Xia, Liangping,Yin, Shaoyun,&Du, Jinglei.(2016).Single-mode-resonance interference in photoresist sub-micron waveguide for high exposure depth nanolithography.MICROELECTRONIC ENGINEERING,154,8-11.
MLA	Yang, Zheng,et al."Single-mode-resonance interference in photoresist sub-micron waveguide for high exposure depth nanolithography".MICROELECTRONIC ENGINEERING 154(2016):8-11.