Individual and Simultaneous Stripping Voltammetric and Mutual Interference Analysis of Cd2+, Pb2+ and Hg2+ with Reduced Graphene Oxide-Fe3O4 Nanocomposites (vol 185, pg 52, 2015)

doi:10.1016/j.electacta.2016.01.169

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	Individual and Simultaneous Stripping Voltammetric and Mutual Interference Analysis of Cd2+, Pb2+ and Hg2+ with Reduced Graphene Oxide-Fe3O4 Nanocomposites (vol 185, pg 52, 2015)
	Xiong, Shiquan 1; Yang, Bingyi 2; Cai, Dongqing 1; Qiu, Guannan 1; Wu, Zhengyan 1
刊名	ELECTROCHIMICA ACTA
	2016-01-10
卷号	188 期号:无页码:928-928
DOI	10.1016/j.electacta.2016.01.169
文献子类	Correction
WOS研究方向	Electrochemistry
语种	英语
WOS记录号	WOS:000370986500109
内容类型	期刊论文
源URL	[http://ir.hfcas.ac.cn:8080/handle/334002/22304]
专题	合肥物质科学研究院_技术生物与农业工程研究所
作者单位	1.Chinese Acad Sci & Anhui Prov, Hefei Inst Phys Sci, Key Lab Ion Beam Bioengn, Hefei 230031, Anhui, Peoples R China 2.Guangdong Pharm Univ, Sch Publ Hlth, Guangzhou 510310, Guangdong, Peoples R China
推荐引用方式 GB/T 7714	Xiong, Shiquan,Yang, Bingyi,Cai, Dongqing,et al. Individual and Simultaneous Stripping Voltammetric and Mutual Interference Analysis of Cd2+, Pb2+ and Hg2+ with Reduced Graphene Oxide-Fe3O4 Nanocomposites (vol 185, pg 52, 2015)[J]. ELECTROCHIMICA ACTA,2016,188(无):928-928.
APA	Xiong, Shiquan,Yang, Bingyi,Cai, Dongqing,Qiu, Guannan,&Wu, Zhengyan.(2016).Individual and Simultaneous Stripping Voltammetric and Mutual Interference Analysis of Cd2+, Pb2+ and Hg2+ with Reduced Graphene Oxide-Fe3O4 Nanocomposites (vol 185, pg 52, 2015).ELECTROCHIMICA ACTA,188(无),928-928.
MLA	Xiong, Shiquan,et al."Individual and Simultaneous Stripping Voltammetric and Mutual Interference Analysis of Cd2+, Pb2+ and Hg2+ with Reduced Graphene Oxide-Fe3O4 Nanocomposites (vol 185, pg 52, 2015)".ELECTROCHIMICA ACTA 188.无(2016):928-928.