Fabrication and characterization of He-charged ODS-FeCrNi films deposited by a radio-frequency plasma magnetron sputtering technique

doi:10.1088/2058-6272/aa57f0

CORC > 合肥物质科学研究院 > 中国科学院合肥物质科学研究院 > 中科院固体物理研究所

	Fabrication and characterization of He-charged ODS-FeCrNi films deposited by a radio-frequency plasma magnetron sputtering technique
	Song, Liang 1; Wang, Xianping 1; Wang, Le 1,2; Zhang, Ying1,2 ; Liu, Wang 1; Jiang, Weibing 1; Zhang, Tao 1; Fang, Qianfeng1 ; Liu, Changsong1
刊名	PLASMA SCIENCE & TECHNOLOGY
	2017-04-01
卷号	19 期号:4 页码:1-8
关键词	Radio-frequency Plasma Magnetron Sputtering He-charged Fecrni-based Film Nanoindentation Hardness Elastic Recoil Detection He Implantation
DOI	10.1088/2058-6272/aa57f0
文献子类	Article
英文摘要	He-charged oxide dispersion strengthened (ODS) FeCrNi films were prepared by a radio-frequency (RF) plasma magnetron sputtering method in a He and Ar mixed atmosphere at 150 degrees C. As a comparison, He-charged FeCrNi films were also fabricated at the same conditions through direct current (DC) plasma magnetron sputtering. The doping of He atoms and Y2O3 in the FeCrNi films was realized by the high backscattered rate of He ions and Y2O3/FeCrNi composite target sputtering method, respectively. Inductive coupled plasma (ICP) and x-ray photoelectron spectroscopy (XPS) analysis confirmed the existence of Y2O3 in FeCrNi films, and Y2O3 content hardly changed with sputtering He/Ar ratio. Cross-sectional scanning electron microscopy (SEM) shows that the FeCrNi films were composed of dense columnar nanocrystallines and the thickness of the films was obviously dependent on He/Ar ratio. Nanoindentation measurements revealed that the FeCrNi films fabricated through DC/RF plasma magnetron sputtering methods exhibited similar hardness values at each He/Ar ratio, while the dispersion of Y2O3 apparently increased the hardness of the films. Elastic recoil detection (ERD) showed that DC/RF magnetron sputtered FeCrNi films contained similar He amounts (similar to 17 at.%). Compared with the minimal change of He level with depth in DC-sputtered films, the He amount decreases gradually in depth in the RF-sputtered films. The Y2O3-doped FeCrNi films were shown to exhibit much smaller amounts of He owing to the lower backscattering possibility of Y2O3 and the inhibition effect of nano-sized Y2O3 particles on the He element.
WOS关键词	FERRITIC ALLOY ; TITANIUM FILMS ; HELIUM ; MICROSTRUCTURE ; STEEL ; PARTICLES ; TENSILE
WOS研究方向	Physics
语种	英语
WOS记录号	WOS:000398146600010
资助机构	National Natural Science Foundation of China(11374299) ; National Natural Science Foundation of China(11374299) ; National Natural Science Foundation of China(11374299) ; National Natural Science Foundation of China(11374299) ; National Natural Science Foundation of China(11374299) ; National Natural Science Foundation of China(11374299) ; National Natural Science Foundation of China(11374299) ; National Natural Science Foundation of China(11374299)
内容类型	期刊论文
源URL	[http://ir.hfcas.ac.cn:8080/handle/334002/32956]
专题	合肥物质科学研究院_中科院固体物理研究所
作者单位	1.Chinese Acad Sci, Inst Solid State Phys, Key Lab Mat Phys, Hefei 230031, Peoples R China 2.Univ Sci & Technol China, Hefei 230026, Peoples R China
推荐引用方式 GB/T 7714	Song, Liang,Wang, Xianping,Wang, Le,et al. Fabrication and characterization of He-charged ODS-FeCrNi films deposited by a radio-frequency plasma magnetron sputtering technique[J]. PLASMA SCIENCE & TECHNOLOGY,2017,19(4):1-8.
APA	Song, Liang.,Wang, Xianping.,Wang, Le.,Zhang, Ying.,Liu, Wang.,...&Liu, Changsong.(2017).Fabrication and characterization of He-charged ODS-FeCrNi films deposited by a radio-frequency plasma magnetron sputtering technique.PLASMA SCIENCE & TECHNOLOGY,19(4),1-8.
MLA	Song, Liang,et al."Fabrication and characterization of He-charged ODS-FeCrNi films deposited by a radio-frequency plasma magnetron sputtering technique".PLASMA SCIENCE & TECHNOLOGY 19.4(2017):1-8.