General analytical expressions for the impact of polarization aberration on lithographic imaging under linearly polarized illumination

CORC > 上海光学精密机械研究所 > 中国科学院上海光学精密机械研究所 > 信息光学与光电技术实验室

	General analytical expressions for the impact of polarization aberration on lithographic imaging under linearly polarized illumination
	Zhang, Heng; Shen, Lina; Wang, Xiangzhao; Li, Sikun; Yan, Guanyong; Zhu, Boer
刊名	J. Opt. Soc. Am. A-Opt. Image Sci. Vis.
	2016
卷号	33 期号:6 页码:1112
通讯作者	wxz26267@siom.ac.cn
英文摘要	With the shrinking of the critical dimension, the impact of polarization aberration on lithographic imaging becomes increasingly prominent. In this paper, the linear relationships between the image placement error and odd Pauli-Zernike polarization aberrations, as well as those between the best focus shift and even Pauli-Zernike polarization aberrations, are established by analyzing the imaging of the alternating phase-shifting mask. The relational expressions of the polarization aberration sensitivities ( PAS) and the polarization angle of illumination are obtained based on these linear relationships. Then the expressions for the zero-value points and extremum points of the PAS are derived, and the impact of the polarization angle of illumination on the PAS is analyzed. The derived analytical expressions match the simulation results well; these can be used to analyze the detrimental impact of polarization aberration on lithographic imaging and provide a theoretical basis for exploring polarization aberration measurement and control techniques. (C)2016 Optical Society of America
收录类别	SCI
资助信息	National Natural Science Foundation of China (NSFC) [61275207, 61205102, 61474129, 61405210]
WOS记录号	WOS:000377513300013
内容类型	期刊论文
源URL	[http://ir.siom.ac.cn/handle/181231/27507]
专题	上海光学精密机械研究所_信息光学与光电技术实验室
作者单位	中国科学院上海光学精密机械研究所
推荐引用方式 GB/T 7714	Zhang, Heng,Shen, Lina,Wang, Xiangzhao,et al. General analytical expressions for the impact of polarization aberration on lithographic imaging under linearly polarized illumination[J]. J. Opt. Soc. Am. A-Opt. Image Sci. Vis.,2016,33(6):1112.
APA	Zhang, Heng,Shen, Lina,Wang, Xiangzhao,Li, Sikun,Yan, Guanyong,&Zhu, Boer.(2016).General analytical expressions for the impact of polarization aberration on lithographic imaging under linearly polarized illumination.J. Opt. Soc. Am. A-Opt. Image Sci. Vis.,33(6),1112.
MLA	Zhang, Heng,et al."General analytical expressions for the impact of polarization aberration on lithographic imaging under linearly polarized illumination".J. Opt. Soc. Am. A-Opt. Image Sci. Vis. 33.6(2016):1112.