Stability of the Sol Gel Silica Antireflective Film Heat Treated at High and Low Temperature

CORC > 上海光学精密机械研究所 > 中国科学院上海光学精密机械研究所 > 高功率激光物理国家实验室

	Stability of the Sol Gel Silica Antireflective Film Heat Treated at High and Low Temperature
	Tang YX(唐永兴); Xiong H(熊怀); Li HY(李海元); Shen B(沈斌); Zhang X(张旭)
刊名	稀有金属材料与工程
	2016
卷号	45 期号:S1 页码:198
通讯作者	bingo2011@siom.ac.cn
中文摘要	以正硅酸乙酯作为前驱体,乙醇作为溶剂通过溶胶凝胶法制备了二氧化硅悬浮液,经粒径测试观察了溶胶体系的平衡稳定性,颗粒粒径在4个月的时间内基本保持在6.5nm左右。运用提拉法以一定的速度在石英玻璃基片上涂膜,分别进行200℃和800℃马弗炉热处理。经过800℃热处理的膜层透过率曲线向短波方向移动,两者透过率峰值波长相差近210nm,但透过率峰值均超过99.8%,光学性能优异。在不同湿度环境下研究不同温度热处理的膜层稳定性,200℃热处理的膜层在不同湿度环境下透过率均大于99.9%,膜层峰值波长在高湿度环境中减
英文摘要	The silica suspension was prepared by a sol gel method using tetraethylorthosilicate (TEOS) as precursor and ethanol as solvent. The stability of the sol system was observed by particle size test. The particle size maintained at about 6.5 nm for 4 months. The quartz substrates were coated by a dipping method and heat treated at 200 degrees C and 800 degrees C in a muffle burner. The film transmittance curve moves to short wavelength direction by about 210 nm, and both the transmittance peaks are more than 99.8%. Therefore, the film' optical properties are excellent. The stabilities of film heat treated at different temperatures were researched in different humidity environments. The transmittances of the films heat treated at 200 degrees C are more than 99.9% and the wavelength of film transmittance peak decreases by about 150 nm. The transmittances of the films heat treated at 800 degrees C reduces by 0.3% and the wavelength of film transmittance peak maintain at 600 nm.
收录类别	SCI
WOS记录号	WOS:000392168800045
内容类型	期刊论文
源URL	[http://ir.siom.ac.cn/handle/181231/27911]
专题	上海光学精密机械研究所_高功率激光物理国家实验室
作者单位	中国科学院上海光学精密机械研究所
推荐引用方式 GB/T 7714	Tang YX,Xiong H,Li HY,et al. Stability of the Sol Gel Silica Antireflective Film Heat Treated at High and Low Temperature[J]. 稀有金属材料与工程,2016,45(S1):198.
APA	唐永兴,熊怀,李海元,沈斌,&张旭.(2016).Stability of the Sol Gel Silica Antireflective Film Heat Treated at High and Low Temperature.稀有金属材料与工程,45(S1),198.
MLA	唐永兴,et al."Stability of the Sol Gel Silica Antireflective Film Heat Treated at High and Low Temperature".稀有金属材料与工程 45.S1(2016):198.