High contrast amplification at 1053 nm limited by pulse stretching-compressing process

CORC > 上海光学精密机械研究所 > 中国科学院上海光学精密机械研究所 > 强场激光物理国家重点实验室

	High contrast amplification at 1053 nm limited by pulse stretching-compressing process
	Lu XM(陆效明); Peng YJ(彭宇杰); Li YY(李妍妍); Guo XY(郭晓杨); Leng YX(冷雨欣); Sui Z(隋展); Xu Y(许毅); Wang XL(王新亮)
刊名	Chin. Opt. Lett.
	2016
卷号	14 期号:2
通讯作者	lengyuxin@mail.siom.ac.cn ; lqling@vip.163.com
英文摘要	We report on our high-contrast laser based on high-contrast, high-energy seed injection, low-gain optical parametric chirped pulse amplification (OPCPA), and Nd:glass amplifiers, which can be used as the high-contrast front end of a high-power Nd:glass chirped pulse amplification (CPA) laser system. The energy of the stretched 1053 nm high-contrast seed pulse increases to 60 mu J by optimizing the frequency doubling crystal in the pulse cleaning device. After passing through a two-stage low-gain OPCPA, a 2-pass 2-rod Nd:glass amplifier, and a compressor the amplified pulse of 131 mJ/282 fs is achieved. The third-order correlation scanning measurement shows that the pulse contrast in the tens of ps range is about 10(-7)-10(-8). With the high-contrast seed passing through the stretcher and compressor only, the contrast measurement indicates that the stretching-compressing process leads mainly to the contrast degradation of the amplified pulse.
收录类别	SCI
WOS记录号	WOS:000371375300020
内容类型	期刊论文
源URL	[http://ir.siom.ac.cn/handle/181231/27641]
专题	上海光学精密机械研究所_强场激光物理国家重点实验室
作者单位	中国科学院上海光学精密机械研究所
推荐引用方式 GB/T 7714	Lu XM,Peng YJ,Li YY,et al. High contrast amplification at 1053 nm limited by pulse stretching-compressing process[J]. Chin. Opt. Lett.,2016,14(2).
APA	陆效明.,彭宇杰.,李妍妍.,郭晓杨.,冷雨欣.,...&王新亮.(2016).High contrast amplification at 1053 nm limited by pulse stretching-compressing process.Chin. Opt. Lett.,14(2).
MLA	陆效明,et al."High contrast amplification at 1053 nm limited by pulse stretching-compressing process".Chin. Opt. Lett. 14.2(2016).