XPS spectra of cu thin films prepared by ionized cluster beam deposition | |
Cao, Bo; Yang, Tongrui; Li, Gongping; Cho, Seongjin; Kim, Hee | |
2012 | |
会议名称 | 2nd International Symposium on Chemical Engineering and Material Properties, ISCEMP 2012 |
会议日期 | June 22, 2012 - June 24, 2012 |
会议地点 | Taiyuan, Shanxi, China |
关键词 | X ray photoelectron spectroscopy Atoms Binding energy Chemical engineering Chemical modification Deposits Ions Photoelectrons Silicon Surface properties Thin films Vapor deposition Atomic binding Bulk materials Copper films Cu thin film Ionized cluster beam deposition Ionized cluster beams Local energy Neutral clusters P-type Si XPS spectra |
卷号 | 549 |
页码 | 720-723 |
通讯作者 | Cao, B. (caobo@ncepu.edu.cn) |
会议录 | Advanced Materials Research |
会议录出版地 | Clausthal-Zellerfeld |
学科主题 | Atomic and Molecular Physics;Chemical Engineering;Chemical Reactions;Physical Chemistry; Materials Science; Engines; Metallurgical Furnaces |
语种 | 英语 |
ISSN号 | 1022-6680 |
内容类型 | 会议论文 |
源URL | [http://ir.lzu.edu.cn/handle/262010/184915] |
专题 | 核科学与技术学院_会议论文 |
推荐引用方式 GB/T 7714 | Cao, Bo,Yang, Tongrui,Li, Gongping,et al. XPS spectra of cu thin films prepared by ionized cluster beam deposition[C]. 见:2nd International Symposium on Chemical Engineering and Material Properties, ISCEMP 2012. Taiyuan, Shanxi, China. June 22, 2012 - June 24, 2012. |
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