The diffusion and interfacial reaction of Cu/Si(100) systems

	The diffusion and interfacial reaction of Cu/Si(100) systems
	Gao, XX; Jia, YH; Li, GP; Ma, JP; Wang, YB
	2011
会议名称	International Conference on Advanced Engineering Materials and Technology (AEMT2011)International Conference on Civil Engineering and Building Materials (CEBM 2011)
会议日期	JUL 29-31, 2011JUL 29-31, 2011
会议地点	Sanya, PEOPLES R CHINAKunming, PEOPLES R CHINA
关键词	Diffusion Interface reaction Annealing
卷号	287-290
页码	2302-2307
通讯作者	Gao, XX (reprint author), Lanzhou Univ, Sch Nucl Sci & Technol, Lanzhou 730000, Peoples R China.
会议录	APPLICATIONS OF ENGINEERING MATERIALS, PTS 1-4
会议录出版地	STAFA-ZURICH
学科主题	Engineering; Materials Science
语种	英语
ISSN号	1022-6680
WOS记录号	WOS:000302894001145
内容类型	会议论文
源URL	[http://ir.lzu.edu.cn/handle/262010/184907]
专题	核科学与技术学院_会议论文
推荐引用方式 GB/T 7714	Gao, XX,Jia, YH,Li, GP,et al. The diffusion and interfacial reaction of Cu/Si(100) systems[C]. 见:International Conference on Advanced Engineering Materials and Technology (AEMT2011)International Conference on Civil Engineering and Building Materials (CEBM 2011). Sanya, PEOPLES R CHINAKunming, PEOPLES R CHINA. JUL 29-31, 2011JUL 29-31, 2011.