Sources for beyond extreme ultraviolet lithography and water window imaging

	Sources for beyond extreme ultraviolet lithography and water window imaging
	O'Sullivan, G; Li, BW; Dunne, P; Hayden, P; Kilbane, D; Lokasani, R; Long, E; Ohashi, H; O'Reilly, F; Sheil, J
刊名	PHYSICA SCRIPTA
	2015-05
卷号	90 期号:5
关键词	lithography water window imaging laser produced plasmas highly charged ions spectroscopy
ISSN号	0031-8949
通讯作者	O'Sullivan, G (reprint author), Univ Coll Dublin, Sch Phys, Dublin 4, Ireland.
学科主题	Physics
出版地	BRISTOL
语种	英语
WOS记录号	WOS:000356498700003
内容类型	期刊论文
源URL	[http://ir.lzu.edu.cn/handle/262010/180928]
专题	核科学与技术学院_期刊论文
推荐引用方式 GB/T 7714	O'Sullivan, G,Li, BW,Dunne, P,et al. Sources for beyond extreme ultraviolet lithography and water window imaging[J]. PHYSICA SCRIPTA,2015,90(5).
APA	O'Sullivan, G.,Li, BW.,Dunne, P.,Hayden, P.,Kilbane, D.,...&Higashiguchi, T.(2015).Sources for beyond extreme ultraviolet lithography and water window imaging.PHYSICA SCRIPTA,90(5).
MLA	O'Sullivan, G,et al."Sources for beyond extreme ultraviolet lithography and water window imaging".PHYSICA SCRIPTA 90.5(2015).