Demagnifying high-resolution imaging based on a new system for nanolithography | |
Meng, QQ; Zhang, XP; Cheng, L; Cao, PF; Li, YE; Jin, X | |
刊名 | OPTICS COMMUNICATIONS
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2011-08-01 | |
卷号 | 284期号:16-17页码:3891-3894 |
关键词 | Photolithography Alternating phase shift mask Planar hyperlens |
ISSN号 | 0030-4018 |
通讯作者 | Zhang, XP (reprint author), Lanzhou Univ, Sch Informat Sci & Engn, Lanzhou 730000, Peoples R China. |
学科主题 | Optics |
出版地 | AMSTERDAM |
语种 | 英语 |
WOS记录号 | WOS:000291920000013 |
内容类型 | 期刊论文 |
源URL | [http://ir.lzu.edu.cn/handle/262010/116187] ![]() |
专题 | 信息科学与工程学院_期刊论文 |
推荐引用方式 GB/T 7714 | Meng, QQ,Zhang, XP,Cheng, L,et al. Demagnifying high-resolution imaging based on a new system for nanolithography[J]. OPTICS COMMUNICATIONS,2011,284(16-17):3891-3894. |
APA | Meng, QQ,Zhang, XP,Cheng, L,Cao, PF,Li, YE,&Jin, X.(2011).Demagnifying high-resolution imaging based on a new system for nanolithography.OPTICS COMMUNICATIONS,284(16-17),3891-3894. |
MLA | Meng, QQ,et al."Demagnifying high-resolution imaging based on a new system for nanolithography".OPTICS COMMUNICATIONS 284.16-17(2011):3891-3894. |
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