Demagnifying high-resolution imaging based on a new system for nanolithography

	Demagnifying high-resolution imaging based on a new system for nanolithography
	Meng, QQ; Zhang, XP; Cheng, L; Cao, PF; Li, YE; Jin, X
刊名	OPTICS COMMUNICATIONS
	2011-08-01
卷号	284 期号:16-17 页码:3891-3894
关键词	Photolithography Alternating phase shift mask Planar hyperlens
ISSN号	0030-4018
通讯作者	Zhang, XP (reprint author), Lanzhou Univ, Sch Informat Sci & Engn, Lanzhou 730000, Peoples R China.
学科主题	Optics
出版地	AMSTERDAM
语种	英语
WOS记录号	WOS:000291920000013
内容类型	期刊论文
源URL	[http://ir.lzu.edu.cn/handle/262010/116187]
专题	信息科学与工程学院_期刊论文
推荐引用方式 GB/T 7714	Meng, QQ,Zhang, XP,Cheng, L,et al. Demagnifying high-resolution imaging based on a new system for nanolithography[J]. OPTICS COMMUNICATIONS,2011,284(16-17):3891-3894.
APA	Meng, QQ,Zhang, XP,Cheng, L,Cao, PF,Li, YE,&Jin, X.(2011).Demagnifying high-resolution imaging based on a new system for nanolithography.OPTICS COMMUNICATIONS,284(16-17),3891-3894.
MLA	Meng, QQ,et al."Demagnifying high-resolution imaging based on a new system for nanolithography".OPTICS COMMUNICATIONS 284.16-17(2011):3891-3894.