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High negative temperature coefficient of resistance of heteroepitaxial (Ba, Sr) TiO3 single crystal films prepared by pulsed laser deposition
Han, WH; Chen, XK; Xie, EQ; Wu, G; Yang, JP; Wang, R; Cao, SZ; Wang, YL
2007-02-26
会议名称5th Asian/European International Conference on Plasma Surface Engineering
会议日期SEP 12-16, 2005
会议地点Qingdao, PEOPLES R CHINA
关键词(Ba, Sr) TiO3 film negative temperature coefficient of resistance oxygen vacancy activation energy thermal imaging
期号9-11
页码5680-5683
通讯作者Xie, EQ (reprint author), Lanzhou Univ, Sch Phys Sci & Technol, Lanzhou 730000, Peoples R China.
会议录SURFACE & COATINGS TECHNOLOGY
会议录出版地LAUSANNE
学科主题Materials Science; Physics
语种英语
ISSN号0257-8972
WOS记录号WOS:000246509400200
内容类型会议论文
源URL[http://ir.lzu.edu.cn/handle/262010/113379]  
专题物理科学与技术学院_会议论文
推荐引用方式
GB/T 7714
Han, WH,Chen, XK,Xie, EQ,et al. High negative temperature coefficient of resistance of heteroepitaxial (Ba, Sr) TiO3 single crystal films prepared by pulsed laser deposition[C]. 见:5th Asian/European International Conference on Plasma Surface Engineering. Qingdao, PEOPLES R CHINA. SEP 12-16, 2005.
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