Deposition of SiCN nano-films by sputtering method on quartz substrate

	Deposition of SiCN nano-films by sputtering method on quartz substrate
	Lin, Hongfeng; Xie, Erqing; Zhang, Jun; Yan, Xiaoqin; Chen, Zhiyong
刊名	Pan Tao Ti Hsueh Pao/Chinese Journal of Semiconductors
	2006-12
卷号	27 期号:SUPPL.页码:124-126
关键词	Quartz substrate Silicon carbon nitride
ISSN号	02534177
通讯作者	Lin, H.
学科主题	Electricity: Basic Concepts and Phenomena;Semiconducting Materials;Coating Materials;Crystalline Solids;
语种	中文
内容类型	期刊论文
源URL	[http://ir.lzu.edu.cn/handle/262010/178072]
专题	物理科学与技术学院_期刊论文
推荐引用方式 GB/T 7714	Lin, Hongfeng,Xie, Erqing,Zhang, Jun,et al. Deposition of SiCN nano-films by sputtering method on quartz substrate[J]. Pan Tao Ti Hsueh Pao/Chinese Journal of Semiconductors,2006,27(SUPPL.):124-126.
APA	Lin, Hongfeng,Xie, Erqing,Zhang, Jun,Yan, Xiaoqin,&Chen, Zhiyong.(2006).Deposition of SiCN nano-films by sputtering method on quartz substrate.Pan Tao Ti Hsueh Pao/Chinese Journal of Semiconductors,27(SUPPL.),124-126.
MLA	Lin, Hongfeng,et al."Deposition of SiCN nano-films by sputtering method on quartz substrate".Pan Tao Ti Hsueh Pao/Chinese Journal of Semiconductors 27.SUPPL.(2006):124-126.