Scaling of the thickness dependent anomalous Hall effect in amorphous ferromagnetic thin films | |
Fan, XL; Chen, H; Rao, JW; Zhou, HA; Zhang, YC; Zhao, XB; Xue, DS | |
刊名 | JOURNAL OF APPLIED PHYSICS
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2014-05-07 | |
卷号 | 115期号:17页码:- |
ISSN号 | 0021-8979 |
通讯作者 | Fan, XL (reprint author), Lanzhou Univ, Minist Educ, Key Lab Magnetism & Magnet Mat, Lanzhou 730000, Peoples R China. |
学科主题 | Physics |
语种 | 英语 |
WOS记录号 | WOS:000335643700372 |
内容类型 | 期刊论文 |
源URL | [http://202.201.7.4/handle/262010/106585] ![]() |
专题 | 物理科学与技术学院_期刊论文 |
推荐引用方式 GB/T 7714 | Fan, XL,Chen, H,Rao, JW,et al. Scaling of the thickness dependent anomalous Hall effect in amorphous ferromagnetic thin films[J]. JOURNAL OF APPLIED PHYSICS,2014,115(17):-. |
APA | Fan, XL.,Chen, H.,Rao, JW.,Zhou, HA.,Zhang, YC.,...&Xue, DS.(2014).Scaling of the thickness dependent anomalous Hall effect in amorphous ferromagnetic thin films.JOURNAL OF APPLIED PHYSICS,115(17),-. |
MLA | Fan, XL,et al."Scaling of the thickness dependent anomalous Hall effect in amorphous ferromagnetic thin films".JOURNAL OF APPLIED PHYSICS 115.17(2014):-. |
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