Thermal stability of epitaxial Fe films grown on Si substrates by molecular beam epitaxy

	Thermal stability of epitaxial Fe films grown on Si substrates by molecular beam epitaxy
	Wei, YP; Gao, CX; Dong, CH; Ma, ZK; Li, JG; Xue, DS
刊名	APPLIED SURFACE SCIENCE
	2014-02-28
卷号	293 页码:71-75
关键词	Thermal stability Magnetic materials Interfacial microscopy Molecular beam epitaxy
ISSN号	0169-4332
通讯作者	Gao, CX (reprint author), Lanzhou Univ, Minist Educ, Key Lab Magnetism & Magnet Mat, Lanzhou 730000, Peoples R China.
学科主题	Chemistry; Materials Science; Physics
语种	英语
WOS记录号	WOS:000330576600009
内容类型	期刊论文
源URL	[http://202.201.7.4/handle/262010/106035]
专题	物理科学与技术学院_期刊论文
推荐引用方式 GB/T 7714	Wei, YP,Gao, CX,Dong, CH,et al. Thermal stability of epitaxial Fe films grown on Si substrates by molecular beam epitaxy[J]. APPLIED SURFACE SCIENCE,2014,293:71-75.
APA	Wei, YP,Gao, CX,Dong, CH,Ma, ZK,Li, JG,&Xue, DS.(2014).Thermal stability of epitaxial Fe films grown on Si substrates by molecular beam epitaxy.APPLIED SURFACE SCIENCE,293,71-75.
MLA	Wei, YP,et al."Thermal stability of epitaxial Fe films grown on Si substrates by molecular beam epitaxy".APPLIED SURFACE SCIENCE 293(2014):71-75.