Controlling of magnetic domain structure by sputtering films on tilted substrates

	Controlling of magnetic domain structure by sputtering films on tilted substrates
	Wang, GX; Dong, CH; Yan, ZJ; Wang, T; Chai, GZ; Jiang, CJ; Xue, DS
刊名	JOURNAL OF ALLOYS AND COMPOUNDS
	2013-10-05
卷号	573 页码:118-121
关键词	Magnetic films Sputtering Magnetic domain structure Ferromagnetic resonance
ISSN号	0925-8388
通讯作者	Jiang, CJ (reprint author), Lanzhou Univ, Key Lab Magnetism & Magnet Mat MOE, Lanzhou 730000, Peoples R China.
学科主题	Chemistry; Materials Science; Metallurgy & Metallurgical Engineering
语种	英语
WOS记录号	WOS:000320585700019
内容类型	期刊论文
源URL	[http://202.201.7.4/handle/262010/105841]
专题	物理科学与技术学院_期刊论文
推荐引用方式 GB/T 7714	Wang, GX,Dong, CH,Yan, ZJ,et al. Controlling of magnetic domain structure by sputtering films on tilted substrates[J]. JOURNAL OF ALLOYS AND COMPOUNDS,2013,573:118-121.
APA	Wang, GX.,Dong, CH.,Yan, ZJ.,Wang, T.,Chai, GZ.,...&Xue, DS.(2013).Controlling of magnetic domain structure by sputtering films on tilted substrates.JOURNAL OF ALLOYS AND COMPOUNDS,573,118-121.
MLA	Wang, GX,et al."Controlling of magnetic domain structure by sputtering films on tilted substrates".JOURNAL OF ALLOYS AND COMPOUNDS 573(2013):118-121.