High frequency characteristics of FeCoAlO thin films fabricated with asymmetric target at different Ar gas flow rates

	High frequency characteristics of FeCoAlO thin films fabricated with asymmetric target at different Ar gas flow rates
	Zheng, F; Luo, FL; Lou, YF; Wang, Y; Bai, JM; Wei, D; Liu, XX; Wei, FL
刊名	JOURNAL OF APPLIED PHYSICS
	2012-04-01
卷号	111 期号:7 页码:-
ISSN号	0021-8979
通讯作者	Bai, JM (reprint author), Lanzhou Univ, Minist Educ, Key Lab Magnetism & Magnet Mat, Lanzhou 730000, Peoples R China.
学科主题	Physics
语种	英语
WOS记录号	WOS:000303282400048
内容类型	期刊论文
源URL	[http://202.201.7.4/handle/262010/105526]
专题	物理科学与技术学院_期刊论文
推荐引用方式 GB/T 7714	Zheng, F,Luo, FL,Lou, YF,et al. High frequency characteristics of FeCoAlO thin films fabricated with asymmetric target at different Ar gas flow rates[J]. JOURNAL OF APPLIED PHYSICS,2012,111(7):-.
APA	Zheng, F.,Luo, FL.,Lou, YF.,Wang, Y.,Bai, JM.,...&Wei, FL.(2012).High frequency characteristics of FeCoAlO thin films fabricated with asymmetric target at different Ar gas flow rates.JOURNAL OF APPLIED PHYSICS,111(7),-.
MLA	Zheng, F,et al."High frequency characteristics of FeCoAlO thin films fabricated with asymmetric target at different Ar gas flow rates".JOURNAL OF APPLIED PHYSICS 111.7(2012):-.