Resistive Switching Properties of Au/ZrO2/Ag Structure for Low-Voltage Nonvolatile Memory Applications | |
Li, YT; Long, SB; Zhang, MH; Liu, Q; Shao, LB; Zhang, S; Wang, Y; Zuo, QY; Liu, S; Liu, M | |
刊名 | IEEE ELECTRON DEVICE LETTERS
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2010-02 | |
卷号 | 31期号:2页码:117-119 |
关键词 | Nonvolatile memory resistance random access memory (RRAM) resistive switching ZrO2 |
ISSN号 | 0741-3106 |
通讯作者 | Li, YT (reprint author), Chinese Acad Sci, Inst Microelect, Lab Nanofabricat & Novel Devices Integrated Techn, Beijing 100029, Peoples R China. |
学科主题 | Engineering |
语种 | 英语 |
WOS记录号 | WOS:000274018000009 |
内容类型 | 期刊论文 |
源URL | [http://202.201.7.4/handle/262010/104902] ![]() |
专题 | 物理科学与技术学院_期刊论文 |
推荐引用方式 GB/T 7714 | Li, YT,Long, SB,Zhang, MH,et al. Resistive Switching Properties of Au/ZrO2/Ag Structure for Low-Voltage Nonvolatile Memory Applications[J]. IEEE ELECTRON DEVICE LETTERS,2010,31(2):117-119. |
APA | Li, YT.,Long, SB.,Zhang, MH.,Liu, Q.,Shao, LB.,...&Liu, M.(2010).Resistive Switching Properties of Au/ZrO2/Ag Structure for Low-Voltage Nonvolatile Memory Applications.IEEE ELECTRON DEVICE LETTERS,31(2),117-119. |
MLA | Li, YT,et al."Resistive Switching Properties of Au/ZrO2/Ag Structure for Low-Voltage Nonvolatile Memory Applications".IEEE ELECTRON DEVICE LETTERS 31.2(2010):117-119. |
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