Structure and properties of C-N films prepared by hot filament assisted rf plasma CVD

	Structure and properties of C-N films prepared by hot filament assisted rf plasma CVD
刊名	JOURNAL OF INORGANIC MATERIALS
	2001-03
卷号	16 期号:2 页码:377-380
关键词	CVD C3N4 XRD SEM hardness
ISSN号	1000-324X
通讯作者	Chen, GH (reprint author), Lanzhou Univ, Dept Phys, Lanzhou 730000, Peoples R China.
学科主题	Materials Science
语种	中文
WOS记录号	WOS:000167638500031
内容类型	期刊论文
源URL	[http://202.201.7.4/handle/262010/103653]
专题	物理科学与技术学院_期刊论文
推荐引用方式 GB/T 7714	. Structure and properties of C-N films prepared by hot filament assisted rf plasma CVD[J]. JOURNAL OF INORGANIC MATERIALS,2001,16(2):377-380.
APA	(2001).Structure and properties of C-N films prepared by hot filament assisted rf plasma CVD.JOURNAL OF INORGANIC MATERIALS,16(2),377-380.
MLA	"Structure and properties of C-N films prepared by hot filament assisted rf plasma CVD".JOURNAL OF INORGANIC MATERIALS 16.2(2001):377-380.