Uniform quantum dot patterns fabricated by soft lithography

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	Uniform quantum dot patterns fabricated by soft lithography
	Zhang, Li; Si, Hua-Yan; Bai, Hua; Zhang, Haoli
	2007
会议名称	International Nano-Optoelectronic Workshop, iNOW
会议日期	July 29, 2007 - August 11, 2007
会议地点	Beijing and Lanzhou, China
关键词	Semiconductor quantum dots Cadmium alloys Cadmium compounds Electron device manufacture Electronic equipment manufacture Gold Lithography Nanoimprint lithography Optical design Optical waveguides Quantum electronics CdSe QDs CdSe quantum dots (QD) Gold substrates International (CO) Microcontact printing] Quantum Dot (CO) Ring arrays Selective dewetting Soft lithography Water condensation
页码	73-74
通讯作者	Zhang, L.
会议录	2007 International Nano-Optelectronics Workshop, iNOW
会议录出版地	Piscataway
学科主题	Organic Compounds;Reproduction, Copying; Electronic Equipment, General Purpose and Industrial
语种	英语
内容类型	会议论文
源URL	[http://ir.lzu.edu.cn/handle/262010/185176]
专题	化学化工学院_会议论文
推荐引用方式 GB/T 7714	Zhang, Li,Si, Hua-Yan,Bai, Hua,et al. Uniform quantum dot patterns fabricated by soft lithography[C]. 见:International Nano-Optoelectronic Workshop, iNOW. Beijing and Lanzhou, China. July 29, 2007 - August 11, 2007.