Direct patterning of polymer-based photo luminescent structures with a mask

	Direct patterning of polymer-based photo luminescent structures with a mask
	Peng J ; Han YC ; Yang YM ; Li BY
刊名	thin solid films
	2004
卷号	450 期号:2 页码:329-333
关键词	LIGHT-EMITTING-DIODES LIQUID-FILMS LASERS MICROSTRUCTURES LITHOGRAPHY DEVICES ARRAYS
ISSN号	0040-6090
通讯作者	han yc
中文摘要	we report a simple method to directly pattern polymer-based photo luminescent material, i.e. a prepatterned mask is placed a close distance above it. the final structure is a positive replica of the lateral structures in the mask with submicrometer resolution. the comparison of luminescence efficiency before and after patterning indicates almost no degradation in optical property of the material during the experiments. the mechanism of pattern formation is also discussed.
收录类别	SCI
语种	英语
WOS记录号	WOS:000220442100017
公开日期	2010-08-17
内容类型	期刊论文
源URL	[http://ir.ciac.jl.cn/handle/322003/15233]
专题	长春应用化学研究所_长春应用化学研究所知识产出_期刊论文
推荐引用方式 GB/T 7714	Peng J,Han YC,Yang YM,et al. Direct patterning of polymer-based photo luminescent structures with a mask[J]. thin solid films,2004,450(2):329-333.
APA	Peng J,Han YC,Yang YM,&Li BY.(2004).Direct patterning of polymer-based photo luminescent structures with a mask.thin solid films,450(2),329-333.
MLA	Peng J,et al."Direct patterning of polymer-based photo luminescent structures with a mask".thin solid films 450.2(2004):329-333.