Beam alignment and convergence analysis of scanning beam interference lithography systems | |
Wang, W.; Bayanheshig; Y. Song; S. Jiang and M. Pan | |
刊名 | Zhongguo Jiguang/Chinese Journal of Lasers
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2016 | |
卷号 | 43期号:12 |
英文摘要 | High-power broad-area (BA) diode lasers often suffer from low beam quality, broad linewidth, and a widened slow-axis far field with increasing current. In this paper, a two-dimensional current-modulated structure is proposed and it is demonstrated that it can reduce not only the far-field sensitivity to the injection current but also the linewidth of the lasing spectra. Injection-insensitive lateral divergence was realized, and the beam parameter product (BPP) was improved by 36.5%. At the same time, the linewidth was decreased by about 45% without significant degradations of emission power and conversion efficiency. (C) 2016 The Japan Society of Applied Physics |
收录类别 | EI |
语种 | 中文 |
内容类型 | 期刊论文 |
源URL | [http://ir.ciomp.ac.cn/handle/181722/57245] ![]() |
专题 | 长春光学精密机械与物理研究所_中科院长春光机所知识产出 |
推荐引用方式 GB/T 7714 | Wang, W.,Bayanheshig,Y. Song,et al. Beam alignment and convergence analysis of scanning beam interference lithography systems[J]. Zhongguo Jiguang/Chinese Journal of Lasers,2016,43(12). |
APA | Wang, W.,Bayanheshig,Y. Song,&S. Jiang and M. Pan.(2016).Beam alignment and convergence analysis of scanning beam interference lithography systems.Zhongguo Jiguang/Chinese Journal of Lasers,43(12). |
MLA | Wang, W.,et al."Beam alignment and convergence analysis of scanning beam interference lithography systems".Zhongguo Jiguang/Chinese Journal of Lasers 43.12(2016). |
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