Undercut structures fabricated by microtransfer printing combined with UV exposure and their applications
Xing RB ; Xuan Y ; Wang Z ; Ma DG ; Han YC
刊名current applied physics
2009
卷号9期号:4页码:760-763
关键词LIGHT-EMITTING-DIODES PASSIVE-MATRIX DISPLAY
ISSN号1567-1739
通讯作者ma dg
中文摘要in this paper. the undercut structures were fabricated by microtransfer printing of metal films on the surface of photoresist combined with uv exposure and photoresist film developing. the patterned metal films were used as mask to realize the selective uv exposure of photoresist firstly. the undercut structures. which consist of the top metal films and the patterned bottom photoresist, formed in the subsequent developing process because of the lateral dissolving of photoresist at the edge of the unexposed regions. the method proposed in this paper has wider tolerance to the changing of the patterning parameters. but, without effect on patterning resolution since the metal film was used as the top layer. the undercut structures were used as separators to pattern passive-matrix display of organic light-emitting diodes (oleds). no visible difference of the device performance was observed compared with the oleds patterned by the shadow mask.
收录类别SCI
语种英语
WOS记录号WOS:000264737400010
公开日期2010-05-28
内容类型期刊论文
源URL[http://202.98.16.49/handle/322003/12557]  
专题长春应用化学研究所_长春应用化学研究所知识产出_期刊论文
推荐引用方式
GB/T 7714
Xing RB,Xuan Y,Wang Z,et al. Undercut structures fabricated by microtransfer printing combined with UV exposure and their applications[J]. current applied physics,2009,9(4):760-763.
APA Xing RB,Xuan Y,Wang Z,Ma DG,&Han YC.(2009).Undercut structures fabricated by microtransfer printing combined with UV exposure and their applications.current applied physics,9(4),760-763.
MLA Xing RB,et al."Undercut structures fabricated by microtransfer printing combined with UV exposure and their applications".current applied physics 9.4(2009):760-763.
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