CORC  > 厦门大学  > 萨本栋-已发表论文
A local bottom-gate structure with low parasitic capacitance for dielectrophoresis assembly and electrical characterization of suspended nanomaterials
Wang, Tun ; Liu, Bin ; Jiang, Shusen ; Rong, Hao ; Lu, Miao ; Wang T(王暾)
刊名http://dx.doi.org/10.1088/0960-1317/24/5/055025
2014
关键词NANOTUBE MECHANICAL RESONATOR FIELD-EFFECT TRANSISTORS HIGH-FREQUENCY PERFORMANCE WALLED CARBON NANOTUBES ALIGNED ARRAYS FABRICATION OPERATION EXPOSURE SENSORS GHZ
英文摘要NSFC [61071010]; A device including a pair of top electrodes and a local gate in the bottom of an SU-8 trench was fabricated on a glass substrate for dielectrophoresis assembly and electrical characterization of suspended nanomaterials. The three terminals were made of gold electrodes and electrically isolated from each other by an air gap. Compared to the widely used global back-gate silicon device, the parasitic capacitance between the three terminals was significantly reduced and an individual gate was assigned to each device. In addition, the spacing from the bottom-gate to either the source or drain was larger than twice the source-drain gap, which guaranteed that the electric field between the source and drain in the dielectrophoresis assembly was not distinguished by the bottom-gate. To prove the feasibility and versatility of the device, a suspended carbon nanotube and graphene film were assembled by dielectrophoresis and characterized successfully. Accordingly, the proposed device holds promise for the electrical characterization of suspended nanomaterials, especially in a high frequency resonator or transistor configuration.
语种英语
出版者IOP PUBLISHING LTD
内容类型期刊论文
源URL[http://dspace.xmu.edu.cn/handle/2288/90430]  
专题萨本栋-已发表论文
推荐引用方式
GB/T 7714
Wang, Tun,Liu, Bin,Jiang, Shusen,et al. A local bottom-gate structure with low parasitic capacitance for dielectrophoresis assembly and electrical characterization of suspended nanomaterials[J]. http://dx.doi.org/10.1088/0960-1317/24/5/055025,2014.
APA Wang, Tun,Liu, Bin,Jiang, Shusen,Rong, Hao,Lu, Miao,&王暾.(2014).A local bottom-gate structure with low parasitic capacitance for dielectrophoresis assembly and electrical characterization of suspended nanomaterials.http://dx.doi.org/10.1088/0960-1317/24/5/055025.
MLA Wang, Tun,et al."A local bottom-gate structure with low parasitic capacitance for dielectrophoresis assembly and electrical characterization of suspended nanomaterials".http://dx.doi.org/10.1088/0960-1317/24/5/055025 (2014).
个性服务
查看访问统计
相关权益政策
暂无数据
收藏/分享
所有评论 (0)
暂无评论
 

除非特别说明,本系统中所有内容都受版权保护,并保留所有权利。


©版权所有 ©2017 CSpace - Powered by CSpace