电化学沉积制备羟基磷灰石涂层及机理研究

CORC > 厦门大学 > 2002年第8卷

	电化学沉积制备羟基磷灰石涂层及机理研究; Pure HAP Film Prepared by Direct Electrodepositing on Metallic Surface and Its Mechanism
	胡皓冰 ; 林昌健 ; 陈菲 ; 胡仁 ; 郭明 ; HU Hao_bing ; LIN Chang_jian ; CHEN Fei ; HU Ren ; GUO Ming
刊名	http://electrochem.xmu.edu.cn/CN/abstract/abstract9164.shtml
	2002-08-28
关键词	羟基磷灰石电化学沉积涂层机理 Hydroxyapatite Ceramic Film Mechanism
英文摘要	控制电沉积溶液中钙 /磷离子的浓度 ,在钛合金表面直接沉积羟基磷灰石 (HAP)陶瓷涂层 .XRD、SEM实验证实 ,制备的HAP晶粒完整 ,粒度均匀 .热力学计算表明HAP比TCP更易于生成 .文中讨论了羟基磷灰石 (HAP)涂层电沉积的机理 ,指出电沉积是一个二步过程 ,HAP的形成是从溶液中离子到固体的直接过程 ,没有前驱体的生成; In controlling concentration of Ca 2+ and PO 4 3- in electrodeposition solution, the HAP film on Ti alloy has been deposited directly. Using XRD and SEM we have learned that prepared HAP is intact in crystal and equal in dimension. Thermodynamic calculation indicated that the HAP is easer formation of than that TCP of. With the XRD, SEM analyses and thermodynamic calculation, the electrodeposition mechanism has been discussed. It was proved that electrodepositon is a two_stage process and formation of HAP is a direct process from solution ions to HAP crystal without precursor.; 作者联系地址：厦门大学化学系,厦门大学化学系,厦门大学化学系,厦门大学化学系,厦门大学化学系材料系,固体表面物理化学国家重点实验室,福建厦门361005 ,材料系,固体表面物理化学国家重点实验室,福建厦门361005 ,材料系,固体表面物理化学国家重点实验室,福建厦门361005 ,材料系,固体表面; Author's Address: State Key Laboratory for Physical Chemistry of Solid Surfaces, Department of Chemistry, Department of Materials Science and Engineering, Xiamen University, Xiamen 361005,China
语种	中文
出版者	厦门大学《电化学》编辑部
内容类型	期刊论文
源URL	[http://dspace.xmu.edu.cn/handle/2288/57668]
专题	2002年第8卷
推荐引用方式 GB/T 7714	胡皓冰,林昌健,陈菲,等. 电化学沉积制备羟基磷灰石涂层及机理研究, Pure HAP Film Prepared by Direct Electrodepositing on Metallic Surface and Its Mechanism[J]. http://electrochem.xmu.edu.cn/CN/abstract/abstract9164.shtml,2002.
APA	胡皓冰.,林昌健.,陈菲.,胡仁.,郭明.,...&GUO Ming.(2002).电化学沉积制备羟基磷灰石涂层及机理研究.http://electrochem.xmu.edu.cn/CN/abstract/abstract9164.shtml.
MLA	胡皓冰,et al."电化学沉积制备羟基磷灰石涂层及机理研究".http://electrochem.xmu.edu.cn/CN/abstract/abstract9164.shtml (2002).