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	Fabrication of holographic photonic crystal template with back incident interference beams
	Liu, Y ; Liu, S ; Zhang, XS ; Li, SS ; Ren, XC ; Li SS(李森森)
	2005
关键词	LITHOGRAPHY
英文摘要	Conference Name:Conference on Holography, Diffractive Optics and Applications II. Conference Address: Beijing, PEOPLES R CHINA. Time:NOV 08-11, 2004.; Photonic crystal template can be fabricated by holographic lithography in photoresist. A method for enhancing the quality of holographic photonic crystal template is mentioned in this paper. Because light energy is absorbed by photoresist while propagating through the material, the exposure decreases with the depth of the photoresist layer. In order to compensate for the light energy losing in exposure process, the recording plate is flipped to let the interference beams incident on the side of glass substrate instead of the surface of the material. During the development, the etching is proceeding quickly into the lower part of the material while the structure on the surface is maintained. Experimentally, face centered cubic lattice structures were fabricated in the AZ-4620 positive photoresist using an Ar+ laser with wavelength of 458 nm. Good 3D lattice structures have been obtained using this method. Theoretical analysis, computer simulation and experimental results obtained with the interference beams incident on different sides of the photoresist plate are presented in the paper.
语种	英语
出处	http://dx.doi.org/10.1117/12.575450
出版者	P SOC PHOTO-OPT INS
内容类型	其他
源URL	[http://dspace.xmu.edu.cn/handle/2288/86463]
专题	信息技术－会议论文
推荐引用方式 GB/T 7714	Liu, Y,Liu, S,Zhang, XS,et al. Fabrication of holographic photonic crystal template with back incident interference beams. 2005-01-01.

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