Resonant cavity enhanced photoluminescence of tensile strained Ge/SiGe quantum wells on silicon-on-insulator substrate | |
Chen, Li-qun ; Chen, Yang-hua ; Li, Cheng ; Li C(李成) | |
刊名 | http://dx.doi.org/10.1007/s11801-014-4021-y
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2014 | |
关键词 | Cavity resonators Chemical vapor deposition Germanium Interfaces (materials) Photoluminescence Silicon Silicon on insulator technology Substrates |
英文摘要 | The tensile strained Ge/SiGe multiple quantum wells (MQWs) grown on a silicon-on-insulator (SOI) substrate were fabricated successfully by ultra-high chemical vapor deposition. Room temperature direct band photoluminescence from Ge quantum wells on SOI substrate is strongly modulated by Fabry-Perot cavity formed between the surface of Ge and the interface of buried SiO2. The photoluminescence peak intensity at 1.58 μm is enhanced by about 21 times compared with that from the Ge/SiGe quantum wells on Si substrate, and the full width at half maximum (FWHM) is significantly reduced. It is suggested that tensile strained Ge/SiGe multiple quantum wells are one of the promising materials for Si-based microcavity light emitting devices. ? 2014 Tianjin University of Technology and Springer-Verlag Berlin Heidelberg. |
语种 | 英语 |
出版者 | Springer Verlag |
内容类型 | 期刊论文 |
源URL | [http://dspace.xmu.edu.cn/handle/2288/92267] ![]() |
专题 | 物理技术-已发表论文 |
推荐引用方式 GB/T 7714 | Chen, Li-qun,Chen, Yang-hua,Li, Cheng,et al. Resonant cavity enhanced photoluminescence of tensile strained Ge/SiGe quantum wells on silicon-on-insulator substrate[J]. http://dx.doi.org/10.1007/s11801-014-4021-y,2014. |
APA | Chen, Li-qun,Chen, Yang-hua,Li, Cheng,&李成.(2014).Resonant cavity enhanced photoluminescence of tensile strained Ge/SiGe quantum wells on silicon-on-insulator substrate.http://dx.doi.org/10.1007/s11801-014-4021-y. |
MLA | Chen, Li-qun,et al."Resonant cavity enhanced photoluminescence of tensile strained Ge/SiGe quantum wells on silicon-on-insulator substrate".http://dx.doi.org/10.1007/s11801-014-4021-y (2014). |
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