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Resonant cavity enhanced photoluminescence of tensile strained Ge/SiGe quantum wells on silicon-on-insulator substrate
Chen, Li-qun ; Chen, Yang-hua ; Li, Cheng ; Li C(李成)
刊名http://dx.doi.org/10.1007/s11801-014-4021-y
2014
关键词Cavity resonators Chemical vapor deposition Germanium Interfaces (materials) Photoluminescence Silicon Silicon on insulator technology Substrates
英文摘要The tensile strained Ge/SiGe multiple quantum wells (MQWs) grown on a silicon-on-insulator (SOI) substrate were fabricated successfully by ultra-high chemical vapor deposition. Room temperature direct band photoluminescence from Ge quantum wells on SOI substrate is strongly modulated by Fabry-Perot cavity formed between the surface of Ge and the interface of buried SiO2. The photoluminescence peak intensity at 1.58 μm is enhanced by about 21 times compared with that from the Ge/SiGe quantum wells on Si substrate, and the full width at half maximum (FWHM) is significantly reduced. It is suggested that tensile strained Ge/SiGe multiple quantum wells are one of the promising materials for Si-based microcavity light emitting devices. ? 2014 Tianjin University of Technology and Springer-Verlag Berlin Heidelberg.
语种英语
出版者Springer Verlag
内容类型期刊论文
源URL[http://dspace.xmu.edu.cn/handle/2288/92267]  
专题物理技术-已发表论文
推荐引用方式
GB/T 7714
Chen, Li-qun,Chen, Yang-hua,Li, Cheng,et al. Resonant cavity enhanced photoluminescence of tensile strained Ge/SiGe quantum wells on silicon-on-insulator substrate[J]. http://dx.doi.org/10.1007/s11801-014-4021-y,2014.
APA Chen, Li-qun,Chen, Yang-hua,Li, Cheng,&李成.(2014).Resonant cavity enhanced photoluminescence of tensile strained Ge/SiGe quantum wells on silicon-on-insulator substrate.http://dx.doi.org/10.1007/s11801-014-4021-y.
MLA Chen, Li-qun,et al."Resonant cavity enhanced photoluminescence of tensile strained Ge/SiGe quantum wells on silicon-on-insulator substrate".http://dx.doi.org/10.1007/s11801-014-4021-y (2014).
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