High refractive index TiO2 film deposited by electron beam evaporation

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	High refractive index TiO2 film deposited by electron beam evaporation
	Yao, J. K. ; Huang, H. L. ; Ma, J. Y. ; Jin, Y. X. ; Zhao, Y. A. ; Shao, J. D. ; He, H. B. ; Yi, K. ; Fan, Z. X. ; Zhang, F. ; Wu, Z. Y. ; Wu ZY(吴正云)
刊名	http://dx.doi.org/10.1179/026708408X329498
	2009-04
关键词	DAMAGE THRESHOLD THIN-FILMS MULTILAYERS
英文摘要	The well known 'crystal seed' theory is first applied in this work to prepare TiO2 film: a high refractive index rutile TiO2 film is grown by electron beam evaporation on the rutile seed formed by 1100 degrees C annealing. The average n is larger than 2.4, by far the highest in all the authors' TiO2 films. The films are characterised by optical properties, microstructure and surface morphologies. It is found that the refractive index shows positive relation with the crystal structure, grain size, and packing density and roughness of the film. The film has lower density of granularity and nodule defects on the surface than those of the film deposited by magnetron sputtering. The result shows attractive application in complex filter and laser coatings.
语种	英语
出版者	SURF ENG
内容类型	期刊论文
源URL	[http://dspace.xmu.edu.cn/handle/2288/91587]
专题	物理技术－已发表论文
推荐引用方式 GB/T 7714	Yao, J. K.,Huang, H. L.,Ma, J. Y.,et al. High refractive index TiO2 film deposited by electron beam evaporation[J]. http://dx.doi.org/10.1179/026708408X329498,2009.
APA	Yao, J. K..,Huang, H. L..,Ma, J. Y..,Jin, Y. X..,Zhao, Y. A..,...&吴正云.(2009).High refractive index TiO2 film deposited by electron beam evaporation.http://dx.doi.org/10.1179/026708408X329498.
MLA	Yao, J. K.,et al."High refractive index TiO2 film deposited by electron beam evaporation".http://dx.doi.org/10.1179/026708408X329498 (2009).