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Nanoscale avalanche photodiode with self-quenching and ultrahigh ultraviolet/visible rejection ratio
Hong, Rongdun ; Hong RD(洪荣墩) ; Zhou, Yi ; Xie, Yannan ; Xie, Yannan ; Chen, Xiaping ; Zhang, Zifeng ; Wang, Kang L. ; Wu, Zhengyun
2012-09
关键词PHOTODETECTORS PERFORMANCE DETECTORS LAYER
英文摘要A 4H-SiC based separate-absorption-multiplication (SAM) avalanche photodiode with a nanoscale multiplication region and a bulk absorption region is proposed and its optoelectronic performance is modeled. The results show that the avalanche breakdown voltage of the device is found to be dependent on the illumination condition. This is attributed to the existence of an illumination-dependent hole potential well in the upper center of the absorption region. Based on the illumination-dependence of avalanche breakdown voltage, a self-quenching and an ultrahigh UV/visible rejection ratio have been realized in this structure. (c) 2012 Optical Society of America; National Natural Science Foundation of China [61176049]; Natural Science Foundation of Fujian Province [2009J05151]
语种英语
出版者OPTICAL SOC AMER
内容类型期刊论文
源URL[http://dspace.xmu.edu.cn/handle/2288/14732]  
专题物理技术-已发表论文
推荐引用方式
GB/T 7714
Hong, Rongdun,Hong RD,Zhou, Yi,et al. Nanoscale avalanche photodiode with self-quenching and ultrahigh ultraviolet/visible rejection ratio[J],2012.
APA Hong, Rongdun.,洪荣墩.,Zhou, Yi.,Xie, Yannan.,Xie, Yannan.,...&Wu, Zhengyun.(2012).Nanoscale avalanche photodiode with self-quenching and ultrahigh ultraviolet/visible rejection ratio..
MLA Hong, Rongdun,et al."Nanoscale avalanche photodiode with self-quenching and ultrahigh ultraviolet/visible rejection ratio".(2012).
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