Factors Influencing Hydroxyl Radical Formation in a Photo-Induced Confined Etching System

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	Factors Influencing Hydroxyl Radical Formation in a Photo-Induced Confined Etching System
	Hu Yan ; Fang Qiu-Yan ; Zhou Jian-Zhang ; Zhan Dong-Ping ; Shi Kang ; Tan Zhong-Qun ; Tian Zhao-Wu ; Zhou JZ(周剑章) ; Zhan DP(詹东平) ; Shi K(时康) ; Tian ZW(田昭武) ; Tian ZQ(田中群)
刊名	http://dx.doi.org/10.3866/PKU.WHXB201309043
	2013
关键词	ELECTROCHEMICAL IMPEDANCE SPECTROSCOPY TIO2 NANOTUBE PHOTOELECTROCATALYTIC DEGRADATION O-2(CENTER-DOT-) PLANARIZATION REACTIVITY OXIDATION ELECTRODE VOLTAGE ARRAYS
英文摘要	National Natural Science Foundation of China [91023043, 21021002, 91023006]; In this paper, we studied the formation of free center dot OH on a TiO2 nanotube array electrode in a photo-induced confined etching system. We used fluorescence spectroscopy, transient photocurrent response, electrochemical impedance spectroscopy (EIS), and Mott-Schottky analysis to investigate the influence of several key factors, including the applied potential, the illumination time, and the pH value. The highest efficiency for the photoelectrocatalytic formation of free OH on the TiO2 nanotube array electrode was achieved at an applied potential of 1.0 V (vs a saturated calomel electrode (SCE)); the photoelectrocatalytic generation and consumption of free center dot OH quickly approached a steady state in this system, as the confined etching layer formed by center dot OH remained stable during illumination. This may allow good control of the etching precision during continuous etching processes. The highest efficiency for the photoelectrocatalytic formation of free center dot OH on the TiO2 nanotube array electrode was observed at pH 10. The results have an important significance for regulating and optimizing photo-induced confined etching system, which can be used to improve the etching speed or the leveling precision during the planarization of copper.
语种	英语
出版者	PEKING UNIV PRESS
内容类型	期刊论文
源URL	[http://dspace.xmu.edu.cn/handle/2288/88833]
专题	化学化工－已发表论文
推荐引用方式 GB/T 7714	Hu Yan,Fang Qiu-Yan,Zhou Jian-Zhang,et al. Factors Influencing Hydroxyl Radical Formation in a Photo-Induced Confined Etching System[J]. http://dx.doi.org/10.3866/PKU.WHXB201309043,2013.
APA	Hu Yan.,Fang Qiu-Yan.,Zhou Jian-Zhang.,Zhan Dong-Ping.,Shi Kang.,...&田中群.(2013).Factors Influencing Hydroxyl Radical Formation in a Photo-Induced Confined Etching System.http://dx.doi.org/10.3866/PKU.WHXB201309043.
MLA	Hu Yan,et al."Factors Influencing Hydroxyl Radical Formation in a Photo-Induced Confined Etching System".http://dx.doi.org/10.3866/PKU.WHXB201309043 (2013).