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	Perpendicular magnetic anisotropy of Fe-Cr-N films prepared by DC reactive sputtering
	Peng, D. L. ; Sumiyama, K. ; Konno, T. J. ; Suzuki, K. ; Peng DL(彭栋梁)
	1997
关键词	perpendicular magnetic anisotropy Fe-Cr-N film DC reactive sputtering X-ray diffraction TEM VSM
英文摘要	Fe-Cr-N ternary films prepared by DC magnetron facing-target sputtering show perpendicular magnetic anisotropy. Upon appropriate adjustment of the chemical composition and deposition parameters, saturation magnetization of 0.37-0.5 Wb/m(2) (300-400 emu/cm(3)) and perpendicular coercivity of 6.4 x 10(4)-8.8 x 10(4) A/m (800-1100 Oe) are detected in the Fe-Cr-N films. X-ray diffraction measurements reveal that the films with large perpendicular anisotropy generally consist of the fine-grain alpha-Fe(Cr) phase and the gamma'-(Fe, Cr)(4)N-x (x < 1) phase having a pronounced (200) texture. By TEM observation, we found that the nonmagnetic gamma'-(Fe, Cr)(4)N-x phase displays columnar growth and that the small ferromagnetic alpha-Fe(Cr) grains of about 2-20 nm diameter are located at grain boundaries of gamma'-(Fe, Cr)(4)N-x grains in the Fe71Cr20N9 film.
语种	英语
内容类型	期刊论文
源URL	[http://dspace.xmu.edu.cn/handle/2288/59447]
专题	材料学院－已发表论文
推荐引用方式 GB/T 7714	Peng, D. L.,Sumiyama, K.,Konno, T. J.,et al. Perpendicular magnetic anisotropy of Fe-Cr-N films prepared by DC reactive sputtering[J],1997.
APA	Peng, D. L.,Sumiyama, K.,Konno, T. J.,Suzuki, K.,&彭栋梁.(1997).Perpendicular magnetic anisotropy of Fe-Cr-N films prepared by DC reactive sputtering..
MLA	Peng, D. L.,et al."Perpendicular magnetic anisotropy of Fe-Cr-N films prepared by DC reactive sputtering".(1997).

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